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Precision Alloy Sputtering Targets Designed for Industrial Wear Resistant Components Cutting Tools and Automotive Parts
Ti Time supplies custom chromium sputtering targets for PVD coating, CrN coating, hard coating and decorative coating. Round, rectangular and custom Cr targets are available with different purity, size, surface finish and backing plate bonding options.
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vacuum coating materials tungsten sputtering targets for microelectronics glass display solar cell and functional coating uses
Tungsten Sputtering Target for Semiconductor Thin Films and Functional Coating Ti Time supplies custom tungsten sputtering targets, also known as W sputtering targets, tungsten targets or tungsten PVD targets, for PVD coating, magnetron sputtering, semiconductor-related thin film deposition, microelectronics, glass coating, display coating, solar cells and functional coating applications. Tungsten has a high melting point, high density, good hardness and excellent high
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Molybdenum Sputtering Target Manufacturer | High Purity Mo Target for PVD Coating
Molybdenum Sputtering Target for Display, Solar Cell and Functional Thin Film Coating Ti Time supplies custom molybdenum sputtering targets, also known as Mo sputtering targets, molybdenum targets or Mo PVD targets, for PVD coating, magnetron sputtering, semiconductor-related thin film deposition, flat panel display coating, solar cells, glass coating, microelectronics and functional thin film applications. Molybdenum has a high melting point, good thermal conductivity, good
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Tantalum Sputtering Target Manufacturer | High Purity Ta Target for PVD Coating
Tantalum Sputtering Target for Semiconductor Thin Films and Functional Coating Ti Time supplies custom tantalum sputtering targets, also known as Ta sputtering targets, tantalum targets or Ta PVD targets, for PVD coating, magnetron sputtering, semiconductor-related thin film deposition, integrated circuits, optical coating, glass coating, magnetic storage, optical communication and functional thin film applications. Tantalum is a high-density refractory metal with excellent
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Durable Alloy Sputtering Targets for TiAlN Coating PVD Hard Coating and Oxidation Resistant Thin Film Applications
Titanium Aluminum Sputtering Target for TiAlN Coating and PVD Hard Coating Ti Time supplies custom titanium aluminum sputtering targets, also known as TiAl sputtering targets, titanium aluminum alloy targets or TiAl alloy PVD targets, for PVD coating, magnetron sputtering, TiAlN coating, hard coating, tool coating, decorative coating and functional thin film deposition. Titanium aluminum targets are widely used to prepare TiAl-based films, TiAlN coatings and related
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Tailored Alloy Sputtering Targets for Magnetron Sputtering and PVD Coating with High Purity and Precise Custom Dimensions
Titanium Sputtering Target for PVD Coating and Magnetron Sputtering Ti Time supplies custom titanium sputtering targets, also known as Ti sputtering targets, titanium PVD targets or titanium magnetron sputtering targets, for thin film deposition, TiN coating, decorative PVD coating, tool coating, optical coating, electronic component coating and semiconductor-related thin film processes. Titanium sputtering targets can be produced in round, rectangular, plate, tubular, rotary
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High Purity Chromium Aluminum (Cr-Al) Sputtering Target for PVD & Thin Film Deposition
Chromium Aluminum Sputtering Target for CrAlN, AlCrN and PVD Hard Coating Ti Time supplies custom chromium aluminum sputtering targets, also known as CrAl sputtering targets, AlCr sputtering targets or chromium aluminum alloy targets, for PVD coating, magnetron sputtering, CrAlN coating, AlCrN coating, tool coating, mold coating, hard coating and wear-resistant thin film deposition. Chromium aluminum targets are widely used to prepare CrAlN, AlCrN and chromium-aluminum-based
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Versatile Vacuum Coating Materials Compatible with Magnetron Sputtering Electron Beam Evaporation Techniques
Nickel Copper Sputtering Target Ti Time supplies custom nickel copper sputtering targets , also known as NiCu sputtering targets , Ni-Cu targets or nickel copper alloy targets , for PVD coating, magnetron sputtering, electronic thin films, protective coatings, resistive films, conductive layers and functional thin film deposition. Nickel copper targets are used to deposit NiCu alloy films with good corrosion resistance, stable electrical properties, good adhesion and
