Molybdenum Sputtering Target Manufacturer | High Purity Mo Target for PVD Coating
Product Details
Product Description
Molybdenum Sputtering Target for Display, Solar Cell and Functional Thin Film Coating
Ti Time supplies custom molybdenum sputtering targets, also known as Mo sputtering targets, molybdenum targets or Mo PVD targets, for PVD coating, magnetron sputtering, semiconductor-related thin film deposition, flat panel display coating, solar cells, glass coating, microelectronics and functional thin film applications.
Molybdenum has a high melting point, good thermal conductivity, good electrical conductivity and low thermal expansion. Pure molybdenum and molybdenum alloy sputtering targets are used where stable thin film performance, high-temperature stability, good electrical properties and controlled target quality are required.
- Custom molybdenum sputtering targets for PVD coating and magnetron sputtering
- Pure Mo, TZM, Mo-W, Mo-Re, Mo-Cu and custom molybdenum alloy targets available
- Purity options include 99.9%, 99.95%, 99.97%, 99.99% or customized
- Round, rectangular, planar, rotary and custom-machined molybdenum targets supported
Key Features
Pure molybdenum, TZM, Mo-W, Mo-Re, Mo-Cu and custom molybdenum alloy targets can be selected according to film design and process requirements.
Molybdenum targets are widely used for conductive layers, barrier layers, electrode layers and functional metal films.
Relative density, grain size and surface quality can be controlled according to project requirements and coating process conditions.
Round, rectangular, planar, rotary and custom Mo targets with holes, grooves, chamfers and backing plate bonding are available.
Product Specifications
| Product Name | Molybdenum Sputtering Target |
| Other Names | Mo Sputtering Target, Molybdenum Target, Mo Target, Molybdenum PVD Target |
| Material | Pure molybdenum or molybdenum alloy |
| Purity | 99.9%, 99.95%, 99.97%, 99.99% or customized |
| Alloy Options | TZM, Mo-W, Mo-Re, Mo-Cu or customized molybdenum alloy |
| Relative Density | ≥99% or according to project requirement |
| Grain Size | ≤100 μm or customized according to grade and process |
| Surface Roughness | Ra ≤1.6 μm or customized |
| Manufacturing Process | Powder metallurgy, sintering, rolling, forging, hot isostatic pressing, machining or suitable process according to specification |
| Target Shape | Round, rectangular, planar, rotary or custom-machined shape |
| Surface Finish | Machined, ground, polished or customized |
| Machining Options | Chamfers, holes, grooves, steps, threaded holes and mounting structures |
| Backing Plate | Copper backing plate, molybdenum backing plate or custom backing plate available |
| Application | PVD coating, semiconductor-related thin film, display coating, solar cell, glass coating, microelectronics and functional thin film deposition |
Suitable For
- PVD coating
- Magnetron sputtering
- Flat panel display coating
- Solar cell thin films
- Glass coating
- Microelectronics
- Semiconductor-related thin films
- Functional thin film deposition
Molybdenum and Molybdenum Alloy Options
Different molybdenum materials can be selected according to film performance, process temperature, electrical property, thermal expansion requirement and coating equipment design. Pure molybdenum is widely used for display, solar cell, glass coating and functional thin films, while molybdenum alloys can be selected for more demanding applications.
| Material Type | Typical Feature | Common Use |
| Pure Molybdenum | High melting point, good conductivity and low thermal expansion | Display coating, solar cells, glass coating, semiconductor-related films and functional thin films |
| TZM Alloy | Higher strength and better creep resistance than pure molybdenum at high temperature | High-temperature coating systems and demanding industrial applications |
| Mo-W Alloy | Improved high-temperature strength and stability | Special functional films and high-temperature applications |
| Mo-Re Alloy | Improved ductility and selected high-temperature performance | Special electronic materials and high-temperature thin film applications |
| Mo-Cu Alloy | Combines molybdenum’s low expansion with copper’s thermal conductivity | Thermal management and electronic packaging-related applications |
| Custom Mo Alloy | Alloy composition adjusted by customer requirement | Special coating process or project-based film design |
Final material selection should be confirmed according to coating process, target size, purity requirement, film design and customer technical specification.
Round, rectangular, planar, rotary and custom molybdenum sputtering targets are available.
Available Molybdenum Sputtering Target Shapes
Different PVD coating systems require different molybdenum target structures. Ti Time can produce molybdenum targets according to planar magnetron sputtering equipment, rotary coating systems, display coating lines, solar cell coating equipment or non-standard coating machines.
Applications of Molybdenum Sputtering Targets
Molybdenum sputtering targets are used to deposit molybdenum films and molybdenum-based functional films. They are widely used in flat panel display coating, solar cells, glass coating, semiconductor-related thin films, microelectronics, electronic components and industrial functional coating applications.
Used for display-related molybdenum thin films, electrode layers and functional coating processes.
Used for photovoltaic thin film deposition and selected functional layers in solar cell production.
Used for architectural glass, automotive glass and functional glass coating systems.
Used for conductive layers, barrier layers, electrode layers and functional metal films.
Used in electronic components, integrated circuit-related films and device coating processes.
Small-size Mo targets can be supplied for laboratory sputtering and thin film experiments.
Molybdenum Targets for Display and Solar Cell Applications
High-purity molybdenum sputtering targets are commonly used in flat panel display and solar cell thin film processes. Molybdenum films may be used as electrode layers, conductive layers, barrier layers or functional metal films depending on the coating design.
For display and solar cell coating applications, customers usually require stable purity, controlled density, clean surface finish, suitable grain structure and accurate target dimensions.
Molybdenum Alloy Targets for High-temperature Applications
Molybdenum alloy sputtering targets are selected when higher high-temperature strength, improved creep resistance, better thermal stability or special functional film properties are required. Compared with pure molybdenum, molybdenum alloys can provide improved performance in selected demanding coating or high-temperature application environments.
| Application Area | Typical Use |
| High-temperature Functional Films | Films requiring thermal stability and high-temperature performance |
| Electronic Materials | Selected electronic thin films and thermal management-related materials |
| Industrial Functional Coating | Wear-resistant, conductive or high-temperature coating systems |
| Special R&D Projects | Laboratory thin film research and customer-defined film systems |
Custom Molybdenum Sputtering Targets
Many coating systems require non-standard molybdenum target sizes, alloy grades, strict surface requirements or special mounting structures. Ti Time can produce molybdenum sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Item | Available Capability |
| Material | Pure Mo, TZM, Mo-W, Mo-Re, Mo-Cu or customized molybdenum alloy |
| Shape | Round, rectangular, planar, rotary and custom shapes |
| Size | Diameter, length, width and thickness customized |
| Machining | Chamfers, holes, grooves, steps, threaded holes and mounting structures |
| Surface | Machined, ground, polished or customized surface finish |
| Density / Grain Size | Controlled according to project requirement when specified |
| Backing Plate | Copper, molybdenum or other backing plates upon request |
Backing Plate Bonding
Molybdenum targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Molybdenum Backing Plate | Used for selected high-temperature or special coating systems |
| Indium Bonding | Suitable for some sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
How to Choose a Molybdenum Sputtering Target
To select the correct molybdenum sputtering target, customers should confirm the coating application, material type, purity, density, grain size, target shape, size, surface finish, backing plate requirement and coating equipment structure.
Display coating, solar cell, glass coating, semiconductor-related film, microelectronics or functional film.
Select pure Mo, TZM, Mo-W, Mo-Re, Mo-Cu or custom molybdenum alloy according to film design.
Select 99.9%, 99.95%, 99.97%, 99.99% or project-specific purity according to coating requirement.
Round, rectangular, planar, rotary or special-shaped target according to equipment structure.
Target size, holes, grooves, chamfers, surface roughness and mounting structure should be confirmed.
Check whether copper backing plate, molybdenum backing plate or bonding service is needed.
Quality Control & Export Packaging
Ti Time controls molybdenum sputtering target production from raw material selection to forming, sintering, machining, surface inspection and final packaging. Material certificates, inspection reports or other technical documents can be provided according to customer requirements.
Inspection & Packaging Support
FAQ
A molybdenum sputtering target is a molybdenum material used in PVD or magnetron sputtering systems to deposit molybdenum films and molybdenum-based thin films.
Molybdenum targets are commonly used for flat panel displays, solar cells, glass coating, semiconductor-related thin films, microelectronics, electronic components and functional thin film deposition.
Ti Time can supply molybdenum sputtering targets with purity options such as 99.9%, 99.95%, 99.97% and 99.99%, depending on project requirements.
Yes. Ti Time can supply pure molybdenum and molybdenum alloy targets such as TZM, Mo-W, Mo-Re, Mo-Cu or customized molybdenum alloy targets according to customer requirements.
Yes. Round, rectangular, planar, rotary and custom molybdenum targets can be produced according to drawings, samples or coating equipment requirements.
Yes. Molybdenum targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements. The bonding method can be confirmed according to target size, sputtering power, cooling design and coating system.
Yes. High-purity molybdenum targets are widely used in display coating, solar cell thin film deposition and related functional coating systems. Final specification should be confirmed according to purity, density, grain size, surface condition and process requirements.
Please provide molybdenum purity or alloy grade, target size, shape, quantity, drawing if available, density requirement, grain size requirement, surface finish, backing plate requirement and coating application. Old target photos or coating equipment information are also helpful.
Need Custom Molybdenum Sputtering Targets?
Send us your molybdenum target size, purity or alloy grade, density requirement, grain size requirement, drawing, coating equipment model, surface finish, backing plate requirement and application. Our team will help confirm a suitable Mo sputtering target solution for your PVD coating or magnetron sputtering system.
Contact Ti Time for custom molybdenum sputtering targets for display coating, solar cells, glass coating, semiconductor-related thin films, microelectronics and functional thin film deposition.
Product Highlights
Molybdenum Sputtering Target for Display, Solar Cell and Functional Thin Film Coating Ti Time supplies custom molybdenum sputtering targets, also known as Mo sputtering targets, molybdenum targets or Mo PVD targets, for PVD coating, magnetron sputtering, semiconductor-related thin film deposition, ...
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