Tailored Alloy Sputtering Targets for Magnetron Sputtering and PVD Coating with High Purity and Precise Custom Dimensions
Product Details
Product Description
Titanium Sputtering Target for PVD Coating and Magnetron Sputtering
Ti Time supplies custom titanium sputtering targets, also known as Ti sputtering targets, titanium PVD targets or titanium magnetron sputtering targets, for thin film deposition, TiN coating, decorative PVD coating, tool coating, optical coating, electronic component coating and semiconductor-related thin film processes.
Titanium sputtering targets can be produced in round, rectangular, plate, tubular, rotary and custom-machined shapes. Purity, titanium grade, diameter, thickness, surface finish, hole position, groove structure, backing plate and bonding method can be customized according to drawings, samples or coating equipment requirements.
- Custom titanium sputtering targets for PVD coating and magnetron sputtering
- Purity options include 99.5%, 99.7%, 99.9%, 99.95%, 99.99% or customized
- Round, rectangular, plate, tubular, rotary and special-shaped titanium targets available
- Machining, surface finishing, holes, grooves, steps and backing plate bonding supported
Key Features
Purity and titanium grade can be selected according to coating process, film requirement and customer technical specification.
Round targets, rectangular targets, plate targets, tubular targets, rotary targets and special-shaped targets can be produced.
Holes, grooves, steps, chamfers, threaded holes, mounting structures and surface finish can be machined according to drawings.
Copper backing plate, molybdenum backing plate, indium bonding, elastomer bonding and custom bonding structures are available.
Product Specifications
| Product Name | Titanium Sputtering Target |
| Other Names | Ti Sputtering Target, Titanium Target, Titanium PVD Target, Titanium Magnetron Sputtering Target |
| Material | Titanium |
| Purity | 99.5%, 99.7%, 99.9%, 99.95%, 99.99% or customized |
| Titanium Grade | Gr1, Gr2, Gr3, Gr4 or customized titanium grade |
| Target Shape | Round, rectangular, plate, tubular, rotary or custom-machined shape |
| Size | Customized according to drawing, sample or coating equipment requirement |
| Surface Finish | Machined, polished, fine turned or customized |
| Machining Options | Center holes, side holes, grooves, steps, chamfers, threaded holes and mounting structures |
| Backing Plate | Copper backing plate, molybdenum backing plate or custom backing plate available |
| Bonding Method | Indium bonding, elastomer bonding or customized bonding method |
| Application | PVD coating, magnetron sputtering, TiN coating, decorative coating, tool coating, optical coating and thin film deposition |
Suitable For
- PVD coating
- Magnetron sputtering
- TiN coating
- Decorative coating
- Cutting tool coating
- Optical coating
- Electronic thin film deposition
- Research coating tests
Round, rectangular, plate, tubular, rotary and custom titanium sputtering targets are available.
Available Titanium Sputtering Target Shapes
Different PVD coating systems require different target structures. Ti Time can produce titanium sputtering targets according to planar magnetron sputtering equipment, rotary coating systems, laboratory coating machines or non-standard coating equipment.
Purity and Titanium Grade Selection
Titanium sputtering target selection should be based on coating application, purity requirement, film performance, equipment design and budget. For decorative coating and general PVD coating, commercial purity titanium is commonly used. For electronic, optical or semiconductor-related thin film processes, higher purity and stricter surface control may be required.
| Grade / Purity | Typical Feature | Common Use |
| Gr1 Titanium | High purity, good ductility and low impurity level | High-purity sputtering targets, research coating and electronic thin films |
| Gr2 Titanium | Good balance of purity, strength and machinability | PVD coating, decorative coating, TiN coating and industrial sputtering |
| 99.9% Titanium | Common high-purity option for many coating systems | Decorative PVD coating, tool coating and general thin film deposition |
| 99.95% / 99.99% Titanium | Higher purity for stricter thin film applications | Optical, electronic and semiconductor-related thin film processes |
| Custom Grade | Selected according to technical specification | Project-based coating systems and non-standard requirements |
Please provide purity requirement, target size, film application, equipment model, drawing and surface finish requirement before final production.
Applications of Titanium Sputtering Targets
Titanium sputtering targets are used to deposit titanium films, TiN coatings and titanium-based compound coatings in PVD coating and magnetron sputtering systems. They are widely used in decorative coating, tool coating, optical coating, electronic components, display coating and research coating tests.
Used for gold-color TiN coating and decorative metal surfaces on hardware, watch parts and accessories.
Used to prepare TiN and titanium-based hard coatings for tools, inserts, drills and molds.
Used in selected optical thin film coating and functional surface coating processes.
Used for titanium thin films in electronic component coating and functional film processes.
Used in flat panel display coating and related thin film deposition applications.
Small-size targets can be supplied for laboratory coating tests and process development.
Titanium Targets for TiN Coating
Titanium sputtering targets are commonly used to deposit TiN coatings through reactive sputtering with nitrogen. TiN coatings are widely used for gold-color decorative finishes, cutting tool coatings, mold coatings and wear-resistant mechanical components.
For TiN coating applications, customers usually need to confirm titanium purity, target shape, target size, equipment type, sputtering power, surface condition and whether backing plate bonding is required.
Custom Titanium Sputtering Targets
Many PVD coating systems use non-standard target sizes or installation structures. Ti Time can machine titanium sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Item | Available Capability |
| Target Diameter | Custom round targets according to drawing or equipment requirement |
| Length / Width / Thickness | Custom rectangular and plate targets for industrial coating equipment |
| Holes and Mounting Features | Center holes, side holes, threaded holes, countersunk holes and custom mounting structures |
| Grooves and Steps | Grooves, steps, chamfers and non-standard machined details |
| Surface Finish | Machined, polished, fine turned or customized roughness requirement |
| Bonding | Copper or molybdenum backing plate bonding according to equipment design |
Backing Plate Bonding
Some sputtering systems require titanium targets to be bonded with backing plates for installation stability and heat transfer during coating operation. Ti Time can provide backing plate bonding according to target size, sputtering power, cooling design and coating equipment requirements.
| Bonding Option | Description |
| Copper Backing Plate | Common backing plate option for heat transfer and equipment mounting support |
| Molybdenum Backing Plate | Used for selected sputtering systems and special thermal requirements |
| Indium Bonding | Bonding method used for selected target and backing plate structures |
| Elastomer Bonding | Bonding option selected according to equipment structure and process requirements |
| Custom Bonding Structure | Produced according to drawings or old target samples |
How to Choose a Titanium Sputtering Target
To select the correct titanium sputtering target, customers should confirm the coating application, target shape, purity, grade, size, surface finish, bonding requirement and coating equipment structure.
Decorative coating, TiN coating, tool coating, optical coating, electronic film or research testing.
Select 99.5%, 99.9%, 99.95%, 99.99% or project-specific purity according to film requirement.
Round, rectangular, plate, tubular, rotary or special-shaped target according to equipment.
Holes, grooves, steps, chamfers, threaded holes and surface finish requirements.
Check whether copper backing plate, molybdenum backing plate or bonding service is needed.
Material certificate, inspection report or other documents can be arranged according to requirement.
Quality Control & Export Packaging
Ti Time controls titanium sputtering target production from material selection to machining, surface finish, dimensional inspection and final packaging. Material certificates or inspection reports can be provided according to customer project requirements.
Inspection & Packaging Support
FAQ
A titanium sputtering target is a titanium material used in PVD or magnetron sputtering equipment to deposit titanium films, TiN coatings and titanium-based thin films.
Common purity options include 99.5%, 99.7%, 99.9%, 99.95% and 99.99%. The final purity can be selected according to application and technical requirements.
Yes. Ti Time can produce round, rectangular, plate, tubular, rotary and custom-machined titanium targets according to drawings, samples or coating equipment requirements.
Yes. Center holes, side holes, grooves, steps, chamfers, threaded holes and special mounting structures can be machined according to drawings.
Yes. Titanium targets can be bonded with copper, molybdenum or other backing plates according to target size, cooling design and coating equipment requirements.
Yes. Titanium targets are commonly used for TiN coating through reactive sputtering with nitrogen. TiN coatings are used in decorative coating, tool coating and wear-resistant coating applications.
Please provide purity, grade, target shape, size, quantity, drawing, surface finish, backing plate requirement, bonding requirement and application. Old target photos or coating equipment information are also helpful.
Need Custom Titanium Sputtering Targets?
Send us your target drawing, purity, grade, diameter, thickness, quantity, surface finish, backing plate requirement and coating application. Our team will help confirm a suitable titanium sputtering target solution for your PVD coating or magnetron sputtering system.
Contact Ti Time for custom titanium sputtering targets for PVD coating, TiN coating, decorative coating, tool coating, optical coating and thin film deposition applications.
Product Highlights
Titanium Sputtering Target for PVD Coating and Magnetron Sputtering Ti Time supplies custom titanium sputtering targets, also known as Ti sputtering targets, titanium PVD targets or titanium magnetron sputtering targets, for thin film deposition, TiN coating, decorative PVD coating, tool coating, ...
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