Precision Alloy Sputtering Targets Designed for Industrial Wear Resistant Components Cutting Tools and Automotive Parts
Product Details
Product Description
Chromium Sputtering Target for PVD Coating and CrN Hard Coating
Ti Time supplies custom chromium sputtering targets, also known as Cr sputtering targets, chromium targets or Cr PVD targets, for PVD coating, magnetron sputtering, CrN coating, hard coating, decorative coating, DLC-related coating and functional thin film deposition.
Chromium sputtering targets are widely used to deposit chromium films, CrN coatings and chromium-based thin films. Typical applications include cutting tools, molds, automotive parts, sanitary ware, watches, eyewear, 3C electronics, hardware accessories and industrial wear-resistant components.
- Custom chromium sputtering targets for PVD coating and magnetron sputtering
- Suitable for CrN coating, hard coating, decorative coating and DLC-related coating systems
- Purity options include 99.5%, 99.8%, 99.9%, 99.95%, 99.99% or customized
- Round, rectangular, planar, rotary and custom-machined chromium targets available
Key Features
Chromium purity can be selected according to coating process, film quality, application requirement and customer technical specification.
Chromium targets are commonly used for CrN coating, hard coating, wear-resistant coating and chromium-based PVD coating systems.
Round, rectangular, planar, plate, rotary and special-shaped chromium targets can be produced according to drawings.
Copper backing plate, molybdenum backing plate, indium bonding, elastomer bonding and custom bonding structures are available.
Product Specifications
| Product Name | Chromium Sputtering Target |
| Other Names | Cr Sputtering Target, Chromium Target, Cr Target, Chromium PVD Target |
| Material | Chromium |
| Purity | 99.5%, 99.8%, 99.9%, 99.95%, 99.99% or customized |
| Relative Density | >99.8% or according to project requirement |
| Grain Size | <150 μm, <100 μm or customized according to grade and process |
| Manufacturing Process | Hot isostatic pressing, powder metallurgy, machining or suitable process according to specification |
| Target Shape | Round, rectangular, planar, plate, rotary or custom-machined shape |
| Surface Finish | Machined, ground, polished or customized |
| Machining Options | Chamfers, holes, grooves, steps, threaded holes and mounting structures |
| Backing Plate | Copper backing plate, molybdenum backing plate or custom backing plate available |
| Application | PVD coating, magnetron sputtering, CrN coating, hard coating, decorative coating and functional thin film deposition |
Suitable For
- PVD coating
- Magnetron sputtering
- CrN coating
- Hard coating
- Wear-resistant coating
- Decorative coating
- DLC-related coating
- Functional thin film deposition
Common Chromium Target Sizes
Ti Time can produce chromium sputtering targets according to customer drawings, samples, old target photos or coating equipment requirements. The following sizes are for reference only. Final size, tolerance, purity and bonding requirements should be confirmed before production.
| Target Type | Size Reference |
| Round Chromium Target | Φ301 × 12 mm, Φ160 × 12 mm, Φ100 × 32 mm, Φ105 × 16 mm, Φ63 × 32 mm or customized |
| Rectangular Chromium Target | 170 × 75 × 12 mm, 656 × 133 × 12 mm, 1701 × 132 × 12 mm or customized |
| Large-Size Chromium Target | Length up to about 1800 mm, diameter up to about 340 mm depending on specification |
| Custom Chromium Target | Produced according to drawings, samples or coating equipment requirement |
Round, rectangular, planar, rotary and custom chromium sputtering targets are available.
Available Chromium Sputtering Target Shapes
Different PVD coating systems require different chromium target structures. Ti Time can produce chromium targets according to planar magnetron sputtering equipment, large-area coating systems, laboratory coating machines or non-standard coating equipment.
Purity, Density and Manufacturing Options
Chromium sputtering target selection should be based on coating application, purity requirement, relative density, grain size, target size, surface finish and sputtering equipment design. For hard coating and decorative PVD coating, stable density and uniform surface quality are important for consistent sputtering performance.
| Item | Typical Option | Common Use |
| 99.5% / 99.8% Chromium | Practical purity option | General PVD coating, decorative coating and industrial coating systems |
| 99.9% Chromium | Common high-purity option | CrN coating, hard coating, tool coating and functional thin films |
| 99.95% / 99.99% Chromium | Higher purity for stricter film requirements | Electronic coating, optical coating and research thin film processes |
| Relative Density | >99.8% or according to requirement | Stable sputtering and consistent target performance |
| Grain Size | <150 μm, <100 μm or customized | Selected coating systems requiring controlled microstructure |
Please provide purity, density requirement, grain size requirement, target size, drawing, coating application and backing plate requirement before final production.
Applications of Chromium Sputtering Targets
Chromium sputtering targets are used to deposit chromium films, CrN coatings and chromium-based coating systems. They are widely used in hard coating, decorative coating, tool coating, mold coating, mechanical wear-resistant coating, automotive coating and functional thin film processes.
Used for cutting tools, drills, milling cutters, inserts and wear-resistant tool surfaces.
Used for molds, dies, forming tools and parts requiring durable surface protection.
Used to prepare CrN coatings and chromium-based hard coating systems.
Used for watches, eyewear, sanitary ware, hardware accessories and decorative metal parts.
Used for automotive trim parts, functional coated components and wear-resistant surfaces.
Used for mobile phone parts, electronic housings and functional decorative coatings.
Chromium Targets for CrN Hard Coating
Chromium sputtering targets are commonly used to prepare CrN coatings through reactive sputtering with nitrogen. CrN coatings are widely used in hard coating, mold coating, tool coating, wear-resistant coating and decorative coating applications.
For CrN coating applications, customers usually need to confirm chromium purity, target shape, target size, relative density, surface finish, sputtering equipment type and whether backing plate bonding is required.
Chromium Targets for Decorative and Functional Coating
Chromium-based PVD coatings can provide a smooth metallic appearance, good color stability and practical wear resistance for consumer and industrial products. Chromium targets are used in decorative coating and functional coating processes across many industries.
| Application Area | Typical Products |
| Sanitary Ware | Faucets, bathroom fittings, stainless steel parts and decorative surfaces |
| Watches & Eyewear | Watch cases, straps, glasses frames and fashion accessories |
| 3C Products | Mobile phone parts, electronic housings and decorative components |
| Hardware Accessories | Hinges, handles, trims and decorative metal parts |
| Stainless Steel Decoration | Panels, trims, architectural components and stainless steel decorative sheets |
Custom Chromium Sputtering Targets
Many PVD coating systems require non-standard chromium target sizes or special mounting structures. Ti Time can machine chromium sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Item | Available Capability |
| Shape | Round, rectangular, planar, rotary and custom shapes |
| Size | Diameter, length, width and thickness customized |
| Machining | Chamfers, holes, grooves, steps, threaded holes and mounting structures |
| Surface | Machined, ground, polished or customized surface finish |
| Backing Plate | Copper, molybdenum or other backing plates upon request |
| Packing | Protective export packaging for international shipment |
Backing Plate Bonding
Chromium targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Molybdenum Backing Plate | Used for selected high-temperature or special coating systems |
| Indium Bonding | Suitable for some sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
How to Choose a Chromium Sputtering Target
To select the correct chromium sputtering target, customers should confirm the coating application, target shape, purity, relative density, grain size, size, surface finish, backing plate requirement and coating equipment structure.
CrN coating, hard coating, decorative coating, DLC-related coating or functional thin films.
Select 99.5%, 99.8%, 99.9%, 99.95%, 99.99% or project-specific purity.
Round, rectangular, planar, rotary or special-shaped target according to equipment.
Holes, grooves, steps, chamfers, mounting structures and surface finish requirements.
Check whether copper backing plate, molybdenum backing plate or bonding service is needed.
Material certificate, inspection report, density or grain size report can be arranged when required.
Quality Control & Export Packaging
Ti Time controls chromium sputtering target production from raw material selection to forming, machining, surface inspection and final packaging. Material certificates, inspection reports or other technical documents can be provided according to customer requirements.
Inspection & Packaging Support
FAQ
A chromium sputtering target is a chromium material used in PVD or magnetron sputtering systems to deposit chromium films, CrN coatings and chromium-based thin films.
Chromium targets are commonly used for hard coating, decorative coating, CrN coating, DLC-related coating, tool coating, mold coating, automotive parts, bathroom hardware and electronic product coating.
Ti Time can supply chromium sputtering targets with purity options such as 99.5%, 99.8%, 99.9%, 99.95% and 99.99%, depending on project requirements.
Yes. Round, rectangular, planar, rotary and custom chromium targets can be produced according to drawings, samples or coating equipment requirements.
Yes. Chromium targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements. The bonding method can be confirmed according to target size, sputtering power, cooling design and coating system.
Yes. Chromium targets are commonly used for CrN coating through reactive sputtering with nitrogen. CrN coatings are widely used in tool coating, mold coating, wear-resistant coating and decorative coating applications.
Please provide chromium purity, target size, shape, quantity, drawing if available, surface requirement, backing plate bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Need Custom Chromium Sputtering Targets?
Send us your chromium target size, purity, drawing, coating equipment model, surface finish, backing plate requirement and coating application. Our team will help confirm a suitable Cr sputtering target solution for your PVD coating or magnetron sputtering system.
Contact Ti Time for custom chromium sputtering targets for PVD coating, CrN coating, hard coating, decorative coating and functional thin film applications.
Product Highlights
Ti Time supplies custom chromium sputtering targets for PVD coating, CrN coating, hard coating and decorative coating. Round, rectangular and custom Cr targets are available with different purity, size, surface finish and backing plate bonding options.
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