Durable Alloy Sputtering Targets for TiAlN Coating PVD Hard Coating and Oxidation Resistant Thin Film Applications
Product Details
Product Description
Titanium Aluminum Sputtering Target for TiAlN Coating and PVD Hard Coating
Ti Time supplies custom titanium aluminum sputtering targets, also known as TiAl sputtering targets, titanium aluminum alloy targets or TiAl alloy PVD targets, for PVD coating, magnetron sputtering, TiAlN coating, hard coating, tool coating, decorative coating and functional thin film deposition.
Titanium aluminum targets are widely used to prepare TiAl-based films, TiAlN coatings and related functional coatings. These coatings help improve coating hardness, wear resistance, oxidation resistance and thermal stability for cutting tools, molds, industrial components and functional surfaces.
- Custom TiAl sputtering targets for TiAlN coating and PVD hard coating
- Ti/Al composition can be customized according to coating performance requirements
- Common compositions include TiAl 50:50, 60:40, 70:30, 40:60 and custom atomic ratios
- Round, rectangular, planar, tubular, rotary and special-shaped TiAl targets available
Key Features
Titanium and aluminum atomic ratio can be customized for different TiAlN coating, hard coating and functional thin film requirements.
TiAl targets are commonly used for TiAlN coatings on cutting tools, molds, dies and wear-resistant industrial parts.
Composition control and uniform material structure support stable sputtering performance and coating consistency.
Round, rectangular, planar, tubular, rotary and custom targets with holes, grooves, steps and backing plate bonding are available.
Product Specifications
| Product Name | Titanium Aluminum Sputtering Target |
| Other Names | TiAl Sputtering Target, Titanium Aluminum Alloy Target, TiAl Alloy Target, TiAl PVD Target |
| Material | Titanium Aluminum Alloy |
| Purity | 99.5%, 99.7%, 99.9% or customized |
| Ti/Al Composition | TiAl 50:50, 60:40, 70:30, 40:60, 30:70, 25:75 or customized atomic ratio |
| Aluminum Content | Commonly 10 at%–90 at% or customized according to coating design |
| Titanium Content | Balance or customized |
| Target Shape | Round, rectangular, planar, tubular, rotary or custom-machined shape |
| Manufacturing Process | Powder metallurgy, melting, hot pressing, HIP or suitable process according to specification |
| Surface Finish | Machined, ground, polished or customized |
| Custom Options | Composition, size, shape, tolerance, surface roughness, holes, grooves and backing plate bonding |
| Application | PVD coating, TiAlN coating, tool coating, hard coating, decorative coating and functional thin film deposition |
Suitable For
- TiAlN coating
- Cutting tool coating
- Mold and die coating
- Hard coating
- Wear-resistant coating
- Decorative coating
- Functional thin films
- Research coating tests
Common Titanium Aluminum Compositions
The Ti/Al atomic ratio should be selected according to coating system, target power, reactive gas, substrate material, film design and required coating performance. Ti Time can customize titanium aluminum composition for R&D testing, pilot coating and industrial production.
| Composition | Typical Feature | Common Use |
| TiAl 50:50 at% | Balanced titanium and aluminum composition | General TiAlN coating, hard coating and functional thin films |
| TiAl 60:40 at% | Higher titanium content | Tool coating, wear-resistant coating and industrial PVD coating systems |
| TiAl 70:30 at% | Titanium-rich composition | Coating systems requiring higher titanium content |
| TiAl 40:60 at% | Higher aluminum content | Coatings requiring improved oxidation resistance and aluminum-rich film design |
| TiAl 30:70 / 25:75 at% | Aluminum-rich target composition | Special coating design, R&D testing and customer-defined film systems |
| Custom TiAl Ratio | Designed according to coating process | Special PVD coating, laboratory research and industrial coating development |
Please provide required Ti/Al atomic ratio, purity, coating application, equipment type, target size and drawing before final production.
Round, rectangular, planar, tubular, rotary and custom TiAl sputtering targets are available.
Available Titanium Aluminum Target Shapes
Different PVD coating systems require different TiAl target structures. Ti Time can produce titanium aluminum targets according to planar magnetron sputtering equipment, rotary coating systems, laboratory coating machines or non-standard coating equipment.
Applications of Titanium Aluminum Sputtering Targets
Titanium aluminum sputtering targets are used to deposit TiAl-based films, TiAlN coatings and related hard coating systems. They are widely used in cutting tools, molds, dies, wear-resistant components, decorative coating, electronic components, display coating and laboratory coating tests.
Used for milling cutters, drills, inserts and cutting tools requiring high hardness and thermal stability.
Used for molds, dies and forming tools requiring wear-resistant surface coatings.
Used for TiAlN and related hard coatings with wear resistance and oxidation resistance.
Used for selected decorative coatings on hardware accessories and industrial components.
Used in electronic components, display coating and functional film development.
Small-size TiAl targets can be supplied for laboratory testing and pilot coating trials.
TiAl Targets for TiAlN Tool Coating
Titanium aluminum sputtering targets are commonly used in reactive sputtering with nitrogen to prepare TiAlN coatings. TiAlN coatings are widely used on cutting tools, drills, milling cutters, inserts, molds and industrial components because of their hardness, oxidation resistance and thermal stability.
For tool coating applications, customers usually need to confirm Ti/Al atomic ratio, target shape, target size, sputtering equipment type, target holder structure, surface finish and backing plate requirement.
Custom Titanium Aluminum Sputtering Targets
Many PVD coating systems require non-standard TiAl target compositions, dimensions or installation structures. Ti Time can produce custom titanium aluminum sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Item | Available Capability |
| Composition | Ti/Al atomic ratio customized according to coating design |
| Shape | Round, rectangular, planar, tubular, rotary and custom shapes |
| Size | Diameter, thickness, length and width customized |
| Machining | Holes, grooves, steps, chamfers, threaded holes and mounting structures |
| Surface | Machined, ground, polished or customized surface finish |
| Backing Plate | Copper, molybdenum or custom backing plate bonding upon request |
Backing Plate Bonding
TiAl sputtering targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
| Copper Backing Plate | Common option for heat transfer and coating equipment compatibility |
| Molybdenum Backing Plate | Used for selected coating systems and special thermal requirements |
| Indium Bonding | Bonding method used for selected target and backing plate structures |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
How to Choose a TiAl Sputtering Target
To select the correct titanium aluminum sputtering target, customers should confirm the coating application, Ti/Al ratio, purity, target shape, size, surface finish, backing plate requirement and coating equipment structure.
TiAlN coating, tool coating, mold coating, hard coating, decorative coating or functional thin film.
Select 50:50, 60:40, 70:30, 40:60, 30:70 or custom atomic ratio according to coating design.
Round, rectangular, planar, tubular, rotary or special-shaped target according to equipment.
Holes, grooves, steps, chamfers, mounting structures and surface finish requirements.
Check whether copper backing plate, molybdenum backing plate or bonding service is needed.
Composition report, inspection report and packing documents can be arranged when required.
Quality Control & Export Packaging
Ti Time controls titanium aluminum sputtering target production from raw material selection to composition control, forming, machining, surface inspection and final packaging. Material certificates, composition reports or inspection reports can be provided according to customer requirements.
Inspection & Packaging Support
FAQ
A titanium aluminum sputtering target is an alloy target made from titanium and aluminum. It is mainly used in PVD sputtering systems to deposit TiAl-based films, TiAlN coatings and related functional coatings.
TiAl sputtering targets are commonly used for TiAlN coating, tool coating, hard coating, wear-resistant coating, mold coating, decorative coating, functional thin films and laboratory coating tests.
Yes. The titanium and aluminum atomic ratio can be customized according to coating performance, sputtering process and customer technical requirements.
Common compositions include TiAl 50:50, 60:40, 70:30, 40:60, 30:70 and 25:75 at%. Other ratios can be customized according to coating design.
Yes. Small-size TiAl sputtering targets can be supplied for laboratory testing, research projects, sample coating and pilot production.
Ti Time can supply round, rectangular, planar, tubular, rotary and custom titanium aluminum sputtering targets according to drawings or coating equipment requirements.
Please provide Ti/Al composition, purity, target shape, size, quantity, drawing if available, surface finish, backing plate requirement and application. Old target photos or coating equipment information are also helpful.
Need Custom Titanium Aluminum Sputtering Targets?
Send us your Ti/Al composition, target size, shape, purity, drawing, coating equipment model, backing plate requirement and application. Our team will help confirm a suitable TiAl sputtering target solution for your PVD coating or TiAlN hard coating process.
Contact Ti Time for custom titanium aluminum sputtering targets for TiAlN coating, tool coating, hard coating, decorative coating and functional thin film deposition.
Product Highlights
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