Tailored Alloy Sputtering Targets for Magnetron Sputtering and PVD Coating with High Purity and Precise Custom Dimensions

Titanium Sputtering Target for PVD Coating and Magnetron Sputtering Ti Time supplies custom titanium sputtering targets, also known as Ti sputtering targets, titanium PVD targets or titanium magnetron sputtering targets, for thin film deposition, TiN coating, decorative PVD coating, tool coating, optical coating, electronic component coating and semiconductor-related thin film processes. Titanium sputtering targets can be produced in round, rectangular, plate, tubular, rotary

Precision Alloy Sputtering Targets Designed for Industrial Wear Resistant Components Cutting Tools and Automotive Parts

Ti Time supplies custom chromium sputtering targets for PVD coating, CrN coating, hard coating and decorative coating. Round, rectangular and custom Cr targets are available with different purity, size, surface finish and backing plate bonding options.

Durable Alloy Sputtering Targets for TiAlN Coating PVD Hard Coating and Oxidation Resistant Thin Film Applications

Titanium Aluminum Sputtering Target for TiAlN Coating and PVD Hard Coating Ti Time supplies custom titanium aluminum sputtering targets, also known as TiAl sputtering targets, titanium aluminum alloy targets or TiAl alloy PVD targets, for PVD coating, magnetron sputtering, TiAlN coating, hard coating, tool coating, decorative coating and functional thin film deposition. Titanium aluminum targets are widely used to prepare TiAl-based films, TiAlN coatings and related

High Purity Chromium Aluminum (Cr-Al) Sputtering Target for PVD & Thin Film Deposition

Chromium Aluminum Sputtering Target for CrAlN, AlCrN and PVD Hard Coating Ti Time supplies custom chromium aluminum sputtering targets, also known as CrAl sputtering targets, AlCr sputtering targets or chromium aluminum alloy targets, for PVD coating, magnetron sputtering, CrAlN coating, AlCrN coating, tool coating, mold coating, hard coating and wear-resistant thin film deposition. Chromium aluminum targets are widely used to prepare CrAlN, AlCrN and chromium-aluminum-based