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High Precision Vacuum Coating Materials Optimized to Support Thin Film Deposition and Surface Modification Techniques
Titanium Silicon Sputtering Target Ti Time supplies custom titanium silicon sputtering targets , also known as TiSi sputtering targets or titanium silicon alloy targets , for PVD coating, magnetron sputtering, hard coating, tool coating and wear-resistant thin film deposition. Titanium silicon targets are widely used to prepare TiSiN, Ti-Si-N and titanium-silicon-based coating systems. These coatings are commonly applied to cutting tools, molds, dies and mechanical components
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Durable Vacuum Coating Materials Designed to Improve Wear Resistance and Corrosion Protection in Multiple Industries
Niobium Sputtering Target Ti Time supplies custom niobium sputtering targets , also known as Nb sputtering targets or niobium targets , for PVD coating, magnetron sputtering, superconducting thin films, semiconductor-related thin film deposition, optical coating and functional coating applications. Niobium is a silver-gray refractory metal with good ductility, high melting point, corrosion resistance and stable physical properties. Niobium sputtering targets are used to
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High Purity Silicon Sputtering Target Manufacturer for Semiconductor & Thin Film Deposition
Silicon Sputtering Target for SiO₂, Si₃N₄ and Semiconductor Thin Films Ti Time supplies custom silicon sputtering targets, also known as Si sputtering targets, silicon targets or high-purity silicon targets, for PVD coating, magnetron sputtering, semiconductor-related thin films, optical coating, solar cells, display coating, glass coating, web coating and functional thin film applications. Silicon sputtering targets are used to deposit silicon films and silicon-based
