High Precision Vacuum Coating Materials Optimized to Support Thin Film Deposition and Surface Modification Techniques
Product Details
Product Description
Ti Time supplies custom titanium silicon sputtering targets, also known as TiSi sputtering targets or titanium silicon alloy targets, for PVD coating, magnetron sputtering, hard coating, tool coating and wear-resistant thin film deposition.
Titanium silicon targets are widely used to prepare TiSiN, Ti-Si-N and titanium-silicon-based coating systems. These coatings are commonly applied to cutting tools, molds, dies and mechanical components where high hardness, oxidation resistance, thermal stability and wear resistance are required.
Ti Time can provide round TiSi targets, rectangular TiSi targets, planar targets, tubular targets, rotary targets and custom-machined titanium silicon targets according to customer drawings, samples or coating equipment requirements.
Titanium silicon sputtering targets are used in vacuum coating systems to deposit titanium-silicon alloy films and reactive nitride coatings. In reactive sputtering with nitrogen, TiSi targets can be used to prepare TiSiN and Ti-Si-N coatings for hard coating and tool coating applications.
Titanium contributes to coating toughness and adhesion, while silicon can help improve oxidation resistance and high-temperature stability under suitable coating conditions. TiSi-based coatings are often selected for high-speed cutting, dry machining, mold protection and wear-resistant surface treatment.
Ti Time focuses on stable composition control, controlled machining accuracy and flexible customization. We can support small-batch testing, R&D coating trials and production-size target supply.
| Item | Specification |
|---|---|
| Product Name | Titanium Silicon Sputtering Target |
| Other Names | TiSi Sputtering Target, Titanium Silicon Alloy Target, Ti-Si Target |
| Material | Titanium Silicon Alloy |
| Composition | TiSi 90/10at%, TiSi 85/15at%, TiSi 80/20at%, TiSi 70/30at% or customized |
| Purity | 99.5%, 99.9%, 99.95% or customized |
| Relative Density | ≥99% or according to project requirement |
| Grain Size | Customized according to composition and manufacturing process |
| Manufacturing Process | Powder metallurgy, hot isostatic pressing, vacuum melting, machining or suitable process according to specification |
| Shape | Round, rectangular, planar, tubular, rotary or custom shape |
| Surface Finish | Machined, ground, polished or customized |
| Application | PVD coating, TiSiN coating, hard coating, tool coating, mold coating, wear-resistant coating |
| Custom Options | Composition, purity, size, shape, tolerance, surface finish, backing plate bonding and mounting structure |
Ti Time can supply titanium silicon sputtering targets with different Ti/Si atomic ratios according to coating design, sputtering process and required film performance. The following compositions are common references for TiSiN and Ti-Si-N hard coating applications.
| Composition | Ti Content | Si Content | Typical Feature | Common Application |
|---|---|---|---|---|
| TiSi 90/10 at% | 90 at% | 10 at% | Titanium-rich composition with silicon addition | General TiSiN coating, tool coating, hard coating |
| TiSi 85/15 at% | 85 at% | 15 at% | Balanced toughness and oxidation resistance | Cutting tools, molds, wear-resistant parts |
| TiSi 80/20 at% | 80 at% | 20 at% | Higher silicon content for improved oxidation resistance | High-temperature coating, dry machining applications |
| TiSi 70/30 at% | 70 at% | 30 at% | Silicon-rich design for special coating systems | Project-based coating development |
| Custom TiSi Ratio | Customized | Customized | Adjusted according to film design and coating process | R&D coating trials and special PVD applications |
Note: Final Ti/Si ratio should be confirmed according to coating equipment, target power, reactive gas, substrate material, working temperature and required coating performance.
Ti Time can produce titanium silicon sputtering targets according to customer drawings or coating equipment requirements.
| Target Type | Description |
|---|---|
| Round TiSi Target | Disc-shaped target for planar magnetron sputtering systems |
| Rectangular TiSi Target | Flat rectangular target for large-area or industrial coating equipment |
| Planar TiSi Target | Standard flat target for PVD coating systems |
| Tubular TiSi Target | Tube-shaped target for selected sputtering systems |
| Rotary TiSi Target | Rotating target for continuous coating or higher utilization systems |
| Custom TiSi Target | Produced according to drawings, samples or old target photos |
Titanium silicon sputtering targets are mainly used in hard coating, tool coating and wear-resistant coating applications.
| Application Area | Typical Products |
|---|---|
| Cutting Tool Coating | Milling cutters, drills, inserts, taps and reamers |
| Mold and Die Coating | Pressing molds, forming dies and drawing tools |
| Mechanical Parts | Bearings, shafts, gauges, gears and sliding wear parts |
| High-temperature Coating | Components requiring oxidation resistance and thermal stability |
| Wear-resistant Coating | Parts requiring high hardness and friction resistance |
| Functional Films | TiSiN, Ti-Si-N and titanium-silicon-based coating research |
| R&D Coating Trials | Laboratory thin film deposition and coating process development |
TiSi targets are widely used in cutting tool coating systems. Under suitable PVD process conditions, TiSiN and Ti-Si-N coatings can help improve surface hardness, oxidation resistance and service performance in high-speed cutting, dry machining or high-temperature cutting applications.
Typical tool coating applications include:
| Tool Type | Coating Purpose |
|---|---|
| Milling Cutters | Improve wear resistance and cutting stability |
| Drills | Reduce surface wear and extend service life |
| Cutting Inserts | Improve high-temperature cutting performance |
| Taps and Reamers | Improve surface durability and machining consistency |
| Forming Tools | Improve resistance to friction and surface damage |
Titanium silicon alloy coatings are also used for molds, dies and mechanical components. These coatings can help improve surface durability, oxidation resistance and wear resistance under friction, high load or elevated temperature conditions.
Typical applications include molds, forming tools, drawing tools, bearings, shafts, gears and other mechanical parts requiring surface protection.
Many coating systems require non-standard target sizes, special alloy ratios or customized mounting structures. Ti Time can produce TiSi sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Option | Available Capability |
|---|---|
| Composition | TiSi 90/10at%, TiSi 85/15at%, TiSi 80/20at%, TiSi 70/30at% and customized Ti-Si ratios |
| Shape | Round, rectangular, planar, tubular, rotary and custom shapes |
| Size | Diameter, length, width and thickness customized |
| Machining | Chamfers, holes, grooves, steps and mounting structures |
| Surface | Machined, ground, polished or customized |
| Backing Plate | Copper, molybdenum or other backing plates upon request |
| Packing | Protective export packaging for international shipment |
Titanium silicon targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
|---|---|
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Molybdenum Backing Plate | Used for selected high-temperature or special coating systems |
| Indium Bonding | Suitable for some sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
Ti Time controls titanium silicon target production from raw material selection to alloy preparation, forming, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.
| Inspection Item | Purpose |
|---|---|
| Chemical Composition | Confirm Ti-Si ratio and impurity level |
| Relative Density | Support stable sputtering performance |
| Microstructure | Available when required by the project |
| Dimension Check | Confirm size, tolerance and mounting structure |
| Surface Inspection | Check surface finish and visible defects |
| Packing Inspection | Reduce damage during export transportation |
Material certificates, inspection reports or other technical documents can be provided upon request.
Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum and related alloy sputtering targets for coating and industrial applications. For titanium silicon sputtering targets, we focus on stable composition, practical customization and clear technical communication before production.
| Ti Time Advantage | What It Means for Customers |
|---|---|
| Custom Ti-Si Ratio | Composition can be adjusted according to coating design |
| Flexible Target Shapes | Round, rectangular, planar, tubular, rotary and custom targets |
| Drawing-based Machining | Suitable for non-standard coating equipment |
| Backing Plate Support | Bonding options available upon request |
| R&D and Production Supply | Small quantity testing and batch supply available |
| Export Packaging | Suitable for international shipment |
A titanium silicon sputtering target is a Ti-Si alloy material used in PVD or magnetron sputtering systems to deposit titanium-silicon films, TiSiN coatings and related hard coatings.
TiSi targets are commonly used for tool coating, mold coating, hard coating, wear-resistant coating, high-temperature coating and functional thin film deposition.
Ti Time can supply TiSi 90/10at%, TiSi 85/15at%, TiSi 80/20at%, TiSi 70/30at% and customized Ti-Si ratios according to customer coating requirements.
Yes. Titanium silicon targets are commonly used for TiSiN and Ti-Si-N coatings through reactive sputtering with nitrogen. These coatings are widely used for cutting tools, molds and wear-resistant components.
Yes. Round, rectangular, planar, tubular, rotary and custom titanium silicon targets can be produced according to drawings, samples or coating equipment requirements.
Yes. Titanium silicon targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements.
Please provide target composition, size, shape, quantity, drawing if available, surface requirement, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Ti Time supplies custom titanium silicon sputtering targets for PVD coating, TiSiN coating, tool coating, mold coating and wear-resistant coating applications. Send us your composition, target size, drawing, coating equipment model or application requirements, and we will help confirm a suitable TiSi target solution.
Product Highlights
Titanium Silicon Sputtering Target Ti Time supplies custom titanium silicon sputtering targets, also known as TiSi sputtering targets or titanium silicon alloy targets, for PVD coating, magnetron sputtering, hard coating, tool coating and wear-resistant thin film deposition. Titanium silicon targets ...
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