Durable Vacuum Coating Materials Designed to Improve Wear Resistance and Corrosion Protection in Multiple Industries
Product Details
Product Description
Ti Time supplies custom niobium sputtering targets, also known as Nb sputtering targets or niobium targets, for PVD coating, magnetron sputtering, superconducting thin films, semiconductor-related thin film deposition, optical coating and functional coating applications.
Niobium is a silver-gray refractory metal with good ductility, high melting point, corrosion resistance and stable physical properties. Niobium sputtering targets are used to deposit niobium films and niobium-based thin films where conductivity, corrosion resistance, superconducting properties or special functional performance are required.
Ti Time can provide round niobium targets, rectangular niobium targets, planar targets, rotary targets and custom-machined niobium targets according to customer drawings, samples or coating equipment requirements.
Niobium sputtering targets are used in vacuum coating systems to deposit niobium films and niobium-based thin films. Due to niobium’s high melting point, good ductility, corrosion resistance and low neutron absorption characteristics, niobium materials are widely used in superconducting materials, electronic thin films, functional coatings, special alloys, medical devices and selected nuclear-related applications.
In thin film deposition, niobium targets can be used for superconducting films, corrosion-resistant films, optical coating layers, electronic components and research coating systems.
Ti Time focuses on stable material quality, controlled machining accuracy and flexible customization. We can support both small-batch testing and production-size target supply.
| Item | Specification |
|---|---|
| Product Name | Niobium Sputtering Target |
| Other Names | Nb Sputtering Target, Niobium Target, Nb Target |
| Material | Niobium |
| Purity | 99.5%, 99.9%, 99.95%, 99.99% or customized |
| Relative Density | ≥99% or according to project requirement |
| Grain Size | ≤100 μm or customized according to grade and process |
| Surface Roughness | Ra ≤1.6 μm or customized |
| Density | Approx. 8.57 g/cm³ for pure niobium |
| Melting Point | Approx. 2468°C for pure niobium |
| Manufacturing Process | Electron beam melting, vacuum melting, forging, rolling, annealing, machining or suitable process according to specification |
| Shape | Round, rectangular, planar, rotary or custom shape |
| Surface Finish | Machined, ground, polished or customized |
| Application | PVD coating, superconducting film, semiconductor-related film, optical coating, functional thin film, corrosion-resistant coating |
| Custom Options | Purity, size, shape, tolerance, surface finish, backing plate bonding and mounting structure |
Ti Time can produce niobium sputtering targets according to customer drawings or coating equipment requirements.
| Target Type | Description |
|---|---|
| Round Niobium Target | Disc-shaped target for planar magnetron sputtering systems |
| Rectangular Niobium Target | Flat rectangular target for large-area coating equipment |
| Planar Niobium Target | Standard flat target for PVD and thin film deposition |
| Rotary Niobium Target | Rotating target for selected continuous coating systems |
| Custom Niobium Target | Produced according to drawings, samples or old target photos |
Note: Final size, tolerance, purity, surface condition and bonding requirements should be confirmed before production.
Niobium sputtering targets are suitable for many advanced coating and thin film applications.
| Application Area | Typical Use |
|---|---|
| Superconducting Thin Films | Niobium films and niobium-based superconducting materials |
| Semiconductor-related Films | Functional layers and special metal thin films |
| Optical Coating | Niobium-based optical and functional coating layers |
| Electronic Components | Conductive, protective or functional metal films |
| Corrosion-resistant Coating | Protective films for selected harsh environments |
| Medical-related Materials | Biocompatible thin film and special component applications |
| Research Applications | Laboratory sputtering and thin film experiments |
| Special Alloy Systems | Niobium-related alloy film development |
High-purity niobium sputtering targets can be used in superconducting thin film and electronic coating processes. Niobium films are widely studied and applied in superconducting devices, special electronic components and functional thin film systems.
For these applications, customers usually require higher purity, stable density, controlled grain structure, clean surface condition and tight dimensional tolerance.
Niobium sputtering targets can be used in optical coating and functional thin film deposition. Niobium-based films may be selected where corrosion resistance, film stability, optical performance or special electrical properties are required.
Typical applications include optical components, functional coating systems, research thin film deposition and selected corrosion-resistant coating applications.
In addition to pure niobium targets, Ti Time can also support niobium alloy or niobium-based compound targets according to customer requirements.
| Target Type | Typical Feature | Common Use |
|---|---|---|
| Pure Niobium Target | High purity, good ductility and stable film quality | Superconducting films, electronic films and functional coatings |
| Nb-Zr Target | Improved strength and special alloy performance | Special functional thin film applications |
| Nb-Ti Target | Niobium-titanium alloy film deposition | Superconducting and special alloy film systems |
| Nb2O5 Target | Niobium oxide thin film deposition | Optical coating and dielectric film applications |
| Custom Nb Alloy Target | Composition adjusted by project requirement | Special coating process or film design |
Note: Final target type and composition should be confirmed according to coating process, film design and customer technical specification.
Many coating systems require non-standard niobium target sizes or special mounting structures. Ti Time can produce niobium sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Option | Available Capability |
|---|---|
| Material | Pure Nb, Nb alloy or niobium-based compound target |
| Shape | Round, rectangular, planar, rotary and custom shapes |
| Size | Diameter, length, width and thickness customized |
| Machining | Chamfers, holes, grooves, steps and mounting structures |
| Surface | Machined, ground, polished or customized |
| Backing Plate | Copper, molybdenum or other backing plates upon request |
| Packing | Protective export packaging for international shipment |
Niobium targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
|---|---|
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Molybdenum Backing Plate | Used for selected high-temperature or special coating systems |
| Indium Bonding | Suitable for some sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
Ti Time controls niobium target production from raw material selection to melting, forging, rolling, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.
| Inspection Item | Purpose |
|---|---|
| Chemical Composition | Confirm niobium purity and impurity level |
| Relative Density | Support stable sputtering performance |
| Grain Size | Available when required by the project |
| Dimension Check | Confirm size, tolerance and mounting structure |
| Surface Inspection | Check surface finish and visible defects |
| Packing Inspection | Reduce damage during export transportation |
Material certificates, inspection reports or other technical documents can be provided upon request.
Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum and related alloy sputtering targets for coating and industrial applications. For niobium sputtering targets, we focus on high-purity material selection, stable density, practical customization and clear technical communication before production.
| Ti Time Advantage | What It Means for Customers |
|---|---|
| High-purity Niobium Options | 99.5%, 99.9%, 99.95%, 99.99% or customized |
| Flexible Target Shapes | Round, rectangular, planar, rotary and custom targets |
| Alloy and Compound Options | Pure Nb, Nb-Zr, Nb-Ti, Nb2O5 and custom options |
| Drawing-based Machining | Suitable for non-standard coating equipment |
| Backing Plate Support | Bonding options available upon request |
| R&D and Production Supply | Small quantity testing and batch supply available |
| Export Packaging | Suitable for international shipment |
A niobium sputtering target is a niobium material used in PVD or magnetron sputtering systems to deposit niobium films and niobium-based thin films.
Niobium targets are commonly used for superconducting thin films, semiconductor-related films, optical coating, functional thin films, corrosion-resistant coating and research applications.
Ti Time can supply niobium sputtering targets with purity options such as 99.5%, 99.9%, 99.95% and 99.99%, depending on project requirements.
Yes. Round, rectangular, planar, rotary and custom niobium targets can be produced according to drawings, samples or coating equipment requirements.
Yes. Niobium targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements. The bonding method can be confirmed according to target size, sputtering power, cooling design and coating system.
Yes. High-purity niobium targets are commonly used for superconducting thin film deposition. Final specifications should be confirmed according to purity, density, grain size, surface condition and process requirements.
Yes. Ti Time can support pure niobium, Nb-Zr, Nb-Ti, Nb2O5 and other niobium-based target materials according to customer requirements.
Please provide niobium purity or target composition, target size, shape, quantity, drawing if available, surface requirement, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Ti Time supplies custom niobium sputtering targets for PVD coating, superconducting thin films, semiconductor-related films, optical coating and functional coating applications. Send us your target size, purity, composition, drawing, coating equipment model or application requirements, and we will help confirm a suitable niobium target solution.
Product Highlights
Niobium Sputtering Target Ti Time supplies custom niobium sputtering targets, also known as Nb sputtering targets or niobium targets, for PVD coating, magnetron sputtering, superconducting thin films, semiconductor-related thin film deposition, optical coating and functional coating applications. ...
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