Vacuum Coating Materials for Industrial Applications Enhancing Surface Protection and Durability in Manufacturing Processes
Product Details
Product Description
Ti Time supplies custom AZO sputtering targets, also known as aluminum-doped zinc oxide sputtering targets, Al-doped ZnO targets or ZnO-Al₂O₃ ceramic targets, for PVD coating, magnetron sputtering, transparent conductive films, solar cells, display coating, touch panels, Low-E glass and optical thin film applications.
AZO is a transparent conductive oxide material based on zinc oxide doped with aluminum oxide. It combines good optical transmittance with electrical conductivity and is widely used as a cost-effective alternative to ITO in selected transparent conductive film applications.
Ti Time can provide planar AZO targets, rotary AZO targets, round AZO targets, rectangular AZO targets and custom AZO ceramic targets according to customer drawings, samples or coating equipment requirements.
AZO sputtering targets are used in vacuum coating systems to deposit aluminum-doped zinc oxide thin films. AZO films are widely used as transparent conductive oxide layers in thin-film solar cells, flat panel displays, touch panels, Low-E coated glass, smart glass, optical films and antistatic coatings.
A common AZO target composition is ZnO:Al₂O₃ = 98:2 wt%. Other ratios such as 99:1, 97:3 and 95:5 can also be selected according to conductivity, optical transmittance, sputtering process and customer requirements.
Compared with ITO, AZO is attractive for applications requiring transparent conductivity with reduced dependence on indium. Final film performance depends on target composition, density, microstructure, sputtering power, oxygen partial pressure, substrate temperature and post-treatment conditions.
Ti Time focuses on stable composition control, ceramic target quality, controlled machining accuracy and flexible customization. We can support R&D coating trials, small-batch testing and production-size target supply.
| Item | Specification |
|---|---|
| Product Name | AZO Sputtering Target |
| Other Names | Aluminum-doped Zinc Oxide Target, Al-doped ZnO Target, ZnO-Al₂O₃ Target |
| Material | Aluminum-doped Zinc Oxide Ceramic |
| Composition | ZnO:Al₂O₃ = 99:1 wt%, 98:2 wt%, 97:3 wt%, 95:5 wt% or customized |
| Purity | 99%, 99.9%, 99.99% or customized |
| Density | According to ceramic grade and project requirement |
| Relative Density | ≥95%, ≥98% or according to customer specification |
| Shape | Planar, rotary, round, rectangular, plate or custom shape |
| Manufacturing Process | Powder preparation, forming, sintering, hot pressing, machining or suitable ceramic process according to specification |
| Surface Finish | Ground, polished or customized |
| Application | Transparent conductive film, solar cell, display coating, touch panel, Low-E glass, optical coating, antistatic film |
| Custom Options | Composition, purity, size, shape, density, surface finish, backing plate bonding and mounting structure |
Different ZnO/Al₂O₃ ratios can be selected according to film conductivity, optical transmittance, process temperature, sputtering power and application requirements.
| Composition | ZnO Content | Al₂O₃ Content | Typical Feature | Common Application |
|---|---|---|---|---|
| AZO 99/1 wt% | 99 wt% | 1 wt% | Low aluminum oxide doping for special film design | Optical films, research coating and transparent conductive layers |
| AZO 98/2 wt% | 98 wt% | 2 wt% | Common AZO composition with balanced conductivity and transmittance | Solar cells, displays, touch panels and TCO films |
| AZO 97/3 wt% | 97 wt% | 3 wt% | Higher Al₂O₃ doping for process optimization | Transparent conductive films and functional coating |
| AZO 95/5 wt% | 95 wt% | 5 wt% | High aluminum oxide doping for custom coating design | R&D coating trials and special TCO applications |
| Custom AZO Ratio | Customized | Customized | Adjusted according to coating system and film requirement | Customer-defined transparent conductive films |
Note: Final AZO composition should be confirmed according to coating equipment, substrate material, film resistance, optical transmittance, sputtering process and customer technical specification.
The following table is a general reference for AZO sputtering targets. Final impurity limits can be adjusted according to purity grade, production process and customer specification.
| Item | Reference Control | Purpose |
|---|---|---|
| Main Components | ZnO + Al₂O₃ | Main ceramic composition |
| Common Ratio | 98/2 wt%, 99/1 wt%, 97/3 wt%, 95/5 wt% or customized | Match film conductivity and optical performance |
| Total Purity | 99%, 99.9%, 99.99% or customized | Control film quality and impurity level |
| Metallic Impurities | Controlled according to target grade | Reduce contamination in transparent conductive films |
| Alkali Metals | Low-level control when required | Important for display and electronic applications |
| Oxygen Content | Controlled through ceramic process and sintering conditions | Support stable ceramic structure and sputtering behavior |
| Test Method | ICP, GDMS, XRF or other suitable method upon request | Verification and reporting |
| Documents | Material certificate or inspection report available upon request | Support customer quality documentation |
Note: For transparent conductive film applications, composition uniformity, density, microstructure and surface condition are important for stable sputtering and film quality.
Ti Time can produce AZO sputtering targets according to customer drawings or coating equipment requirements.
| Target Type | Description |
|---|---|
| Planar AZO Target | Flat ceramic target for magnetron sputtering and display coating systems |
| Rotary AZO Target | Cylindrical rotating target for continuous coating and large-area coating lines |
| Round AZO Target | Disc-shaped target for laboratory or small coating systems |
| Rectangular AZO Target | Flat rectangular target for industrial coating equipment |
| Bonded AZO Target | AZO ceramic target bonded with backing plate |
| Custom AZO Target | Produced according to drawings, samples or old target photos |
Ti Time can provide AZO targets according to different coating equipment and project requirements.
| Target Type | Size Capability |
|---|---|
| Planar AZO Target | Length, width and thickness customized according to equipment |
| Rotary AZO Target | Tube length, outer diameter and wall thickness customized |
| Round AZO Target | Diameter and thickness customized |
| Rectangular AZO Target | Length, width and thickness customized |
| Bonded AZO Target | AZO ceramic bonded with copper or other backing plates |
| Custom AZO Target | Produced according to drawings or old target samples |
For quotation, customers can provide target drawings, old target photos, coating equipment model, required composition, purity, density and quantity.
AZO sputtering targets are widely used in transparent conductive and optical thin film applications.
| Application Area | Typical Use |
|---|---|
| Thin-film Solar Cells | Transparent conductive oxide layer for photovoltaic devices |
| Flat Panel Displays | Transparent electrodes and display-related coating layers |
| Touch Panels | Transparent conductive layers for touch screen devices |
| Low-E Glass | Large-area glass coating and energy-saving glass applications |
| Smart Glass | Transparent conductive films for switchable glass |
| Optical Films | Transparent conductive and functional optical coatings |
| Antistatic Coatings | Conductive antistatic layers |
| Sensors | Transparent conductive layers for selected sensor devices |
| Research Coating | Laboratory TCO film deposition and process development |
AZO sputtering targets are widely used to prepare transparent conductive oxide films for thin-film solar cells and other optoelectronic devices. AZO films allow visible light transmission while providing electrical conductivity, making them useful for photovoltaic and transparent electrode applications.
For solar cell applications, customers usually focus on film resistivity, optical transmittance, surface uniformity, target density and coating stability.
AZO targets can also be used for display coating, touch panel transparent electrodes and Low-E coated glass. AZO is selected in some projects as an alternative transparent conductive oxide material where cost, material availability and process compatibility are important.
Final film performance depends on target composition, sputtering atmosphere, oxygen control, substrate temperature, film thickness and post-treatment process.
Many coating systems require non-standard AZO target sizes, special ZnO/Al₂O₃ ratios or bonded target assemblies. Ti Time can produce AZO sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Option | Available Capability |
|---|---|
| Composition | 99/1 wt%, 98/2 wt%, 97/3 wt%, 95/5 wt% and customized ZnO/Al₂O₃ ratios |
| Shape | Planar, rotary, round, rectangular and custom ceramic targets |
| Size | Diameter, length, width, thickness and tube size customized |
| Density | Ceramic density according to project requirement |
| Surface | Ground, polished or customized |
| Backing Plate | Copper or other backing plates upon request |
| Packing | Clean protective packaging for export shipment |
AZO ceramic targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation, especially for ceramic targets that require careful thermal management.
| Bonding Option | Description |
|---|---|
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Indium Bonding | Suitable for many ceramic sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
| Target Assembly | AZO target bonded as a complete sputtering assembly |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
Ti Time controls AZO target production from powder selection to forming, sintering, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.
| Inspection Item | Purpose |
|---|---|
| Chemical Composition | Confirm ZnO/Al₂O₃ ratio and impurity level |
| Density / Relative Density | Support stable sputtering and reduce abnormal arcing risk |
| Microstructure | Support uniform film deposition and stable target performance |
| Dimension Check | Confirm size, tolerance and mounting structure |
| Surface Inspection | Check surface finish, cracks, chips and visible defects |
| Bonding Inspection | Confirm bonding quality when backing plate is required |
| Packing Inspection | Reduce contamination and damage during shipment |
Material certificates, inspection reports or other technical documents can be provided upon request.
Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum, nickel alloys, graphite and ceramic sputtering targets for coating and industrial applications. For AZO sputtering targets, we focus on stable composition, ceramic target quality, clean surface condition, practical customization and clear technical communication before production.
| Ti Time Advantage | What It Means for Customers |
|---|---|
| Common AZO Ratios | 98/2, 99/1, 97/3, 95/5 and custom ZnO/Al₂O₃ ratios available |
| Planar and Rotary Targets | Suitable for laboratory, display, solar cell and large-area coating systems |
| Ceramic Target Quality | Composition, density and surface condition controlled by project |
| Backing Plate Support | Bonded AZO target assemblies available upon request |
| R&D and Production Supply | Small quantity testing and batch supply available |
| Export Packaging | Suitable for international shipment |
An AZO sputtering target is an aluminum-doped zinc oxide ceramic target used in PVD or magnetron sputtering systems to deposit transparent conductive AZO films.
AZO targets are commonly used for thin-film solar cells, transparent conductive films, displays, touch panels, Low-E glass, smart glass, optical films, antistatic coatings and research TCO films.
A common AZO composition is ZnO:Al₂O₃ = 98:2 wt%. Other ratios such as 99:1, 97:3 and 95:5 can also be customized.
Yes. Ti Time can support planar AZO targets, rotary AZO targets, round AZO targets, rectangular AZO targets and custom AZO ceramic targets according to coating equipment requirements.
Yes. AZO ceramic targets can be bonded with copper or other backing plates. Indium bonding and other bonding methods can be discussed according to target size and sputtering equipment.
Ti Time can supply AZO sputtering targets with 99%, 99.9%, 99.99% or customized purity depending on project requirements.
AZO can be used as an alternative transparent conductive oxide material in selected applications. The final choice depends on required conductivity, optical transmittance, process compatibility and cost considerations.
Please provide AZO composition, purity, density requirement, target size, shape, quantity, drawing if available, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Ti Time supplies custom AZO sputtering targets for transparent conductive films, solar cells, displays, touch panels, Low-E glass, optical films and smart glass applications. Send us your ZnO/Al₂O₃ ratio, target size, density requirement, drawing, coating equipment model or application requirements, and we will help confirm a suitable AZO target solution.
Ti Time supplies custom AZO sputtering targets for transparent conductive films, solar cells, displays, touch panels, Low-E glass and optical coatings. Planar, rotary, round and rectangular AZO targets are available with 98/2, 99/1 and custom ZnO/Al₂O₃ ratios.
Product Highlights
AZO Sputtering Target Ti Time supplies custom AZO sputtering targets, also known as aluminum-doped zinc oxide sputtering targets, Al-doped ZnO targets or ZnO-Al₂O₃ ceramic targets, for PVD coating, magnetron sputtering, transparent conductive films, solar cells, display coating, touch panels, Low-E ...
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