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Product Details
Product Description
ITO Sputtering Target
Ti Time supplies custom ITO sputtering targets, also known as indium tin oxide sputtering targets, ITO ceramic targets or In₂O₃-SnO₂ targets, for PVD coating, magnetron sputtering, transparent conductive films, display coating, touch panels, solar cells and optical thin film applications.
ITO is a transparent conductive oxide material made from indium oxide and tin oxide. It combines high optical transparency with good electrical conductivity, making it one of the most widely used materials for transparent conductive thin films.
Ti Time can provide planar ITO targets, rotary ITO targets, round ITO targets, rectangular ITO targets and custom ITO ceramic targets according to customer drawings, samples or coating equipment requirements.
Product Overview
ITO sputtering targets are used in vacuum coating systems to deposit transparent conductive indium tin oxide films. ITO films are widely used as transparent electrodes in flat panel displays, touch screens, OLED displays, solar cells, smart glass, optical films and antistatic coatings.
The most common ITO target composition is In₂O₃:SnO₂ = 90:10 wt%, while other compositions such as 95:5, 97:3, 93:7 and 92.5:7.5 can also be selected according to film conductivity, transparency, process conditions and customer requirements.
For stable sputtering and high-quality film deposition, ITO targets usually require high purity, high density, uniform microstructure, controlled composition and clean surface condition.
Ti Time focuses on stable composition control, ceramic target quality, controlled machining accuracy and flexible customization. We can support R&D coating trials, small-batch testing and production-size target supply.
Technical Specifications
| Item | Specification |
|---|---|
| Product Name | ITO Sputtering Target |
| Other Names | Indium Tin Oxide Target, ITO Ceramic Target, In₂O₃-SnO₂ Target |
| Material | Indium Tin Oxide |
| Composition | In₂O₃:SnO₂ = 90:10 wt%, 95:5 wt%, 97:3 wt%, 93:7 wt%, 92.5:7.5 wt% or customized |
| Purity | 99.9%, 99.99% or customized |
| Density | ≥7.0 g/cm³, ≥7.13 g/cm³ or according to project requirement |
| Relative Density | ≥98%, ≥99% or according to customer specification |
| Shape | Planar, rotary, round, rectangular, plate or custom shape |
| Manufacturing Process | Powder preparation, forming, sintering, hot pressing, machining or suitable ceramic process according to specification |
| Surface Finish | Ground, polished or customized |
| Application | Display coating, touch panel, OLED, solar cell, transparent conductive film, optical coating, antistatic film |
| Custom Options | Composition, purity, size, shape, density, surface finish, backing plate bonding and mounting structure |
ITO Composition Options
Different In₂O₃/SnO₂ ratios can be selected according to film conductivity, optical transmittance, process temperature, sputtering power and application requirements.
| Composition | In₂O₃ Content | SnO₂ Content | Typical Feature | Common Application |
|---|---|---|---|---|
| ITO 90/10 wt% | 90 wt% | 10 wt% | Most common composition with balanced conductivity and transparency | Touch panels, displays, solar cells, transparent electrodes |
| ITO 95/5 wt% | 95 wt% | 5 wt% | Lower tin oxide content for specific film design | Optical films, display coating, research applications |
| ITO 97/3 wt% | 97 wt% | 3 wt% | Indium-rich composition for special transparent conductive films | Optical coating and custom film development |
| ITO 93/7 wt% | 93 wt% | 7 wt% | Intermediate composition for process optimization | Touch screen, display and functional coating |
| ITO 92.5/7.5 wt% | 92.5 wt% | 7.5 wt% | Custom ratio between common 90/10 and 95/5 grades | Project-based transparent conductive films |
| Custom ITO Ratio | Customized | Customized | Adjusted according to coating system and film requirement | R&D coating trials and special PVD applications |
Note: Final ITO composition should be confirmed according to coating equipment, substrate material, film resistance, optical transmittance, sputtering process and customer technical specification.
Chemical Control Reference
The following table is a general reference for ITO sputtering targets. Final impurity limits can be adjusted according to purity grade, production process and customer specification.
| Item | Reference Control | Purpose |
|---|---|---|
| Main Components | In₂O₃ + SnO₂ | Main ceramic composition |
| Common Ratio | 90/10 wt%, 95/5 wt%, 97/3 wt%, 93/7 wt% or customized | Match film conductivity and optical performance |
| Total Purity | 99.9%, 99.99% or customized | Control film quality and impurity level |
| Metallic Impurities | Controlled according to target grade | Reduce contamination in transparent conductive films |
| Alkali Metals | Low-level control when required | Important for display and electronic applications |
| Oxygen Content | Controlled through ceramic process and sintering conditions | Support stable ceramic structure and sputtering behavior |
| Test Method | ICP, GDMS, XRF or other suitable method upon request | Verification and reporting |
| Documents | Material certificate or inspection report available upon request | Support customer quality documentation |
Note: For display and touch panel applications, composition uniformity, density, microstructure and surface condition are important for stable film quality.
Common ITO Target Shapes
Ti Time can produce ITO sputtering targets according to customer drawings or coating equipment requirements.
| Target Type | Description |
|---|---|
| Planar ITO Target | Flat ceramic target for magnetron sputtering and display coating systems |
| Rotary ITO Target | Cylindrical rotating target for continuous coating and large-area coating lines |
| Round ITO Target | Disc-shaped target for laboratory or small coating systems |
| Rectangular ITO Target | Flat rectangular target for industrial coating equipment |
| Bonded ITO Target | ITO ceramic target bonded with backing plate |
| Custom ITO Target | Produced according to drawings, samples or old target photos |
Size Capability
Ti Time can provide ITO targets according to different coating equipment and project requirements.
| Target Type | Size Capability |
|---|---|
| Planar ITO Target | Length, width and thickness customized according to equipment |
| Rotary ITO Target | Tube length, outer diameter and wall thickness customized |
| Round ITO Target | Diameter and thickness customized |
| Rectangular ITO Target | Length, width and thickness customized |
| Bonded ITO Target | ITO ceramic bonded with copper or other backing plates |
| Custom ITO Target | Produced according to drawings or old target samples |
For quotation, customers can provide target drawings, old target photos, coating equipment model, required composition, purity, density and quantity.
Applications of ITO Sputtering Targets
ITO sputtering targets are widely used in transparent conductive thin film applications.
| Application Area | Typical Use |
|---|---|
| Flat Panel Displays | Transparent electrodes for LCD, OLED and display panels |
| Touch Panels | Transparent conductive layers for touch screen devices |
| Solar Cells | Transparent conductive oxide layers for photovoltaic devices |
| OLED Displays | Electrode layers and transparent conductive films |
| Smart Glass | Transparent conductive films for switchable glass |
| Optical Films | Transparent conductive and functional optical coatings |
| Antistatic Coatings | Conductive antistatic layers |
| Sensors | Transparent conductive layers for selected sensor devices |
| Research Coating | Laboratory thin film deposition and process development |
ITO Targets for Display and Touch Panel Coating
ITO sputtering targets are widely used in display and touch panel manufacturing because ITO films provide both transparency and electrical conductivity. These films can be used as transparent electrodes in LCDs, OLED displays, touch sensors and other optoelectronic devices.
For display applications, customers usually require stable composition, high density, clean surface condition, controlled microstructure and reliable batch consistency.
ITO Targets for Solar Cells and Optical Films
ITO targets can also be used to prepare transparent conductive oxide films for solar cells and optical applications. ITO films allow light transmission while providing electrical conductivity, making them useful for photovoltaic devices, optical coatings and functional glass.
The final film performance depends on target composition, sputtering power, oxygen partial pressure, substrate temperature, film thickness and post-treatment conditions.
Custom ITO Sputtering Targets
Many coating systems require non-standard ITO target sizes, special In₂O₃/SnO₂ ratios or bonded target assemblies. Ti Time can produce ITO sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Option | Available Capability |
|---|---|
| Composition | 90/10 wt%, 95/5 wt%, 97/3 wt%, 93/7 wt%, 92.5/7.5 wt% and customized ratios |
| Shape | Planar, rotary, round, rectangular and custom ceramic targets |
| Size | Diameter, length, width, thickness and tube size customized |
| Density | High-density ceramic target according to project requirement |
| Surface | Ground, polished or customized |
| Backing Plate | Copper or other backing plates upon request |
| Packing | Clean protective packaging for export shipment |
Backing Plate Bonding
ITO ceramic targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation, especially for ceramic targets that require careful thermal management.
| Bonding Option | Description |
|---|---|
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Indium Bonding | Suitable for many ceramic sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
| Target Assembly | ITO target bonded as a complete sputtering assembly |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
Quality Control
Ti Time controls ITO target production from powder selection to forming, sintering, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.
| Inspection Item | Purpose |
|---|---|
| Chemical Composition | Confirm In₂O₃/SnO₂ ratio and impurity level |
| Density / Relative Density | Support stable sputtering and reduce abnormal arcing risk |
| Microstructure | Support uniform film deposition and stable target performance |
| Dimension Check | Confirm size, tolerance and mounting structure |
| Surface Inspection | Check surface finish, cracks, chips and visible defects |
| Bonding Inspection | Confirm bonding quality when backing plate is required |
| Packing Inspection | Reduce contamination and damage during shipment |
Material certificates, inspection reports or other technical documents can be provided upon request.
Why Choose Ti Time
Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum, nickel alloys, graphite and ceramic sputtering targets for coating and industrial applications. For ITO sputtering targets, we focus on stable composition, high-density ceramic quality, clean surface condition, practical customization and clear technical communication before production.
| Ti Time Advantage | What It Means for Customers |
|---|---|
| Common ITO Ratios | 90/10, 95/5, 97/3, 93/7 and custom In₂O₃/SnO₂ ratios available |
| Planar and Rotary Targets | Suitable for laboratory, display and large-area coating systems |
| High-density Ceramic Targets | Support stable sputtering and transparent conductive film deposition |
| Backing Plate Support | Bonded ITO target assemblies available upon request |
| R&D and Production Supply | Small quantity testing and batch supply available |
| Export Packaging | Suitable for international shipment |
FAQ
What is an ITO sputtering target?
An ITO sputtering target is an indium tin oxide ceramic target used in PVD or magnetron sputtering systems to deposit transparent conductive ITO films.
What is ITO target used for?
ITO targets are commonly used for flat panel displays, touch panels, OLED displays, solar cells, smart glass, optical films, antistatic coatings and transparent conductive films.
What is the most common ITO composition?
The most common ITO composition is In₂O₃:SnO₂ = 90:10 wt%. Other ratios such as 95:5, 97:3, 93:7 and 92.5:7.5 can also be customized.
Can Ti Time supply rotary ITO targets?
Yes. Ti Time can support planar ITO targets, rotary ITO targets, round ITO targets, rectangular ITO targets and custom ITO ceramic targets according to coating equipment requirements.
Can ITO targets be bonded with backing plates?
Yes. ITO ceramic targets can be bonded with copper or other backing plates. Indium bonding and other bonding methods can be discussed according to target size and sputtering equipment.
What purity can Ti Time provide?
Ti Time can supply ITO sputtering targets with 99.9%, 99.99% or customized purity depending on project requirements.
What information is needed for quotation?
Please provide ITO composition, purity, density requirement, target size, shape, quantity, drawing if available, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Send Inquiry
Ti Time supplies custom ITO sputtering targets for transparent conductive films, display coating, touch panels, solar cells, OLED displays, optical films and smart glass applications. Send us your In₂O₃/SnO₂ ratio, target size, density requirement, drawing, coating equipment model or application requirements, and we will help confirm a suitable ITO target solution.
Product Highlights
ITO Sputtering Target Ti Time supplies custom ITO sputtering targets, also known as indium tin oxide sputtering targets, ITO ceramic targets or In₂O₃-SnO₂ targets, for PVD coating, magnetron sputtering, transparent conductive films, display coating, touch panels, solar cells and optical thin film ...
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