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Quality Comprehensive Range of Vacuum Coating Materials Ideal for in Optical Coatings Magnetic Storage and Wear Resistant Layers factory
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Quality Comprehensive Range of Vacuum Coating Materials Ideal for in Optical Coatings Magnetic Storage and Wear Resistant Layers factory
Quality Comprehensive Range of Vacuum Coating Materials Ideal for in Optical Coatings Magnetic Storage and Wear Resistant Layers factory
>

Comprehensive Range of Vacuum Coating Materials Ideal for in Optical Coatings Magnetic Storage and Wear Resistant Layers

Product Details


Product Description

Nickel Chromium Sputtering Target

Ti Time supplies custom nickel chromium sputtering targets, also known as NiCr sputtering targets, Ni-Cr targets or nickel chromium alloy targets, for PVD coating, magnetron sputtering, Low-E glass coating, electronic thin films, resistive films, hard coating and functional thin film deposition.

Nickel chromium targets are widely used to deposit NiCr alloy films with good corrosion resistance, thermal stability, electrical resistance and coating uniformity. Common Ni/Cr ratios include Ni80Cr20, Ni60Cr40, Ni56Cr44 and customized compositions according to coating process requirements.

Ti Time can provide planar NiCr targets, rotary NiCr targets, round NiCr targets, rectangular NiCr targets and custom-machined nickel chromium targets according to customer drawings, samples or coating equipment requirements.

Nickel chromium sputtering target

Product Overview

Nickel chromium sputtering targets are used in vacuum coating systems to deposit nickel-chromium alloy films. NiCr films are widely used in Low-E glass, large-area architectural glass coating, electronic components, resistive films, heating-related films, protective coatings and selected hard coating applications.

For Low-E glass coating, NiCr layers can help improve visible light transmittance and infrared reflection when used in suitable coating structures. For electronic applications, NiCr films are often used where stable resistance, corrosion resistance and good film uniformity are required.

Ti Time focuses on stable alloy composition, controlled machining accuracy and flexible customization. We can support R&D coating trials, small-batch testing and production-size target supply.

Technical Specifications
Item Specification
Product Name Nickel Chromium Sputtering Target
Other Names NiCr Sputtering Target, Ni-Cr Target, Nickel Chromium Alloy Target
Material Nickel Chromium Alloy
Composition Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 or customized
Purity 99.5%, 99.8%, 99.9%, 99.95% or customized
Shape Planar, rotary, round, rectangular, plate or custom shape
Manufacturing Process Vacuum melting, melting, rolling, machining, thermal spraying or suitable process according to specification
Surface Finish Machined, ground, polished or customized
Application Low-E glass coating, electronic films, resistive films, PVD coating, hard coating, decorative coating, functional thin film
Custom Options Ni/Cr ratio, purity, size, shape, tolerance, surface finish, backing plate bonding and mounting structure

Nickel chromium sputtering target surface finish

Nickel Chromium Composition Options

Different Ni/Cr ratios can be selected according to film resistance, optical performance, corrosion resistance, thermal stability and coating system design.

Composition Ni Content Cr Content Typical Feature Common Application
Ni80Cr20 80 wt% 20 wt% Common NiCr ratio with good corrosion resistance and electrical performance Low-E glass, resistive films, electronic components
Ni60Cr40 60 wt% 40 wt% Higher chromium content for improved oxidation and corrosion resistance Functional coatings, protective films, selected PVD processes
Ni56Cr44 56 wt% 44 wt% Chromium-rich NiCr composition for special coating requirements Glass coating, protective coating and project-based films
Ni50Cr50 50 wt% 50 wt% Balanced Ni-Cr composition for custom coating design R&D coating trials and special thin film applications
Custom NiCr Ratio Customized Customized Adjusted according to film design and sputtering process Custom PVD applications and customer-defined coating systems

Note: Final Ni/Cr ratio should be confirmed according to coating equipment, film design, electrical resistance requirement, optical performance and customer technical specification.

Chemical Control Reference

The following table is a general reference for NiCr sputtering targets. Final impurity limits can be adjusted according to purity grade, production process and customer specification.

Item Ni80Cr20 Reference Ni56Cr44 Reference Control Purpose
Ni Balance Balance Main alloy element
Cr 20 ± 1 wt% 44 ± 1 wt% Main alloy element
C ≤100–200 ppm ≤100–200 ppm Carbon impurity control
N ≤100–200 ppm ≤100–200 ppm Nitrogen impurity control
O ≤200–300 ppm ≤200–300 ppm Oxygen impurity control
Fe Controlled by purity grade Controlled by purity grade Metallic impurity control
Al Controlled by purity grade Controlled by purity grade Metallic impurity control
Si Controlled by purity grade Controlled by purity grade Metallic impurity control
Test Method ICP, GDMS, LECO or suitable method ICP, GDMS, LECO or suitable method Available upon request

Note: The above values are reference ranges. Final chemical composition should be confirmed according to order specification and inspection standard.

Common NiCr Target Shapes

Ti Time can produce nickel chromium sputtering targets according to customer drawings or coating equipment requirements.

Target Type Description
Planar NiCr Target Flat target for magnetron sputtering and large-area coating systems
Rotary NiCr Target Rotating target for continuous glass coating or higher target utilization
Round NiCr Target Disc-shaped target for laboratory or planar sputtering systems
Rectangular NiCr Target Flat rectangular target for industrial coating equipment
Custom NiCr Target Produced according to drawings, samples or old target photos

Custom NiCr sputtering targets in different shapes

Size Capability

Ti Time can provide NiCr targets according to different coating equipment and project requirements.

Target Type Size Capability
Planar NiCr Target Length, width and thickness customized according to equipment
Rotary NiCr Target Tube length, diameter and wall thickness customized
Round NiCr Target Diameter and thickness customized
Rectangular NiCr Target Length, width and thickness customized
Custom NiCr Target Produced according to drawings or old target samples

For quotation, customers can provide target drawings, old target photos, coating equipment model, required Ni/Cr ratio, purity and quantity.

Applications of Nickel Chromium Sputtering Targets

Nickel chromium sputtering targets are used in many coating and thin film applications.

Application Area Typical Use
Low-E Glass Coating Large-area architectural glass and energy-saving glass coating
Electronic Films Electronic components, resistor films and functional metal layers
Resistive Films Thin film resistors, strain gauge films and precision resistance layers
Protective Coating Corrosion-resistant and oxidation-resistant coating layers
Hard Coating Selected tool, mold and mechanical part coating systems
Decorative Coating Hardware, instruments, optical parts and consumer products
Heating-related Films Functional resistance and thermal film applications
R&D Coating Trials Laboratory thin film deposition and process development

NiCr target for Low-E glass and electronic film coating

NiCr Targets for Low-E Glass Coating

Nickel chromium sputtering targets are widely used in large-area glass coating systems, especially in Low-E glass coating structures. Under suitable coating design, NiCr films can help improve visible light transmittance and infrared reflection performance.

For glass coating lines, rotary NiCr targets are commonly selected for continuous coating operation and improved target utilization.

NiCr sputtering target for large-area glass coating

NiCr Targets for Electronic and Resistive Films

NiCr films are also used in electronic components, resistive films and functional thin film systems. Ni80Cr20 is a common composition for resistive and electronic film applications because it provides a useful balance of corrosion resistance, electrical performance and sputtering stability.

Typical applications include thin film resistors, sensor films, electronic functional layers and laboratory film development.

Custom Nickel Chromium Sputtering Targets

Many coating systems require non-standard target sizes, special Ni/Cr ratios or customized mounting structures. Ti Time can produce NiCr sputtering targets according to customer drawings, samples, old target photos or coating equipment information.

Custom Option Available Capability
Composition Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and customized Ni/Cr ratios
Shape Planar, rotary, round, rectangular and custom shapes
Size Diameter, length, width, thickness and tube size customized
Machining Chamfers, holes, grooves, steps and mounting structures
Surface Machined, ground, polished or customized
Backing Plate Copper, molybdenum or other backing plates upon request
Packing Protective export packaging for international shipment

Custom nickel chromium sputtering targets

Backing Plate Bonding

Nickel chromium targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.

Bonding Option Description
Copper Backing Plate Common option for heat transfer and equipment compatibility
Molybdenum Backing Plate Used for selected high-temperature or special coating systems
Indium Bonding Suitable for some sputtering target assemblies
Elastomer Bonding Available according to equipment and project requirements
Custom Bonding Produced according to drawings or old target samples

The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.

Quality Control

Ti Time controls nickel chromium target production from raw material selection to alloy preparation, forming, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.

Inspection Item Purpose
Chemical Composition Confirm Ni/Cr ratio and impurity level
Relative Density Support stable sputtering performance
Microstructure Available when required by the project
Dimension Check Confirm size, tolerance and mounting structure
Surface Inspection Check surface finish and visible defects
Packing Inspection Reduce damage during export transportation

Nickel chromium sputtering target inspection and packaging

Why Choose Ti Time

Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum, nickel alloys and related sputtering targets for coating and industrial applications. For nickel chromium sputtering targets, we focus on stable alloy ratio, practical customization and clear technical communication before production.

Ti Time Advantage What It Means for Customers
Custom Ni/Cr Ratio Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and custom ratios available
Planar and Rotary Targets Suitable for laboratory, industrial and large-area glass coating systems
Drawing-based Machining Suitable for non-standard coating equipment
Backing Plate Support Bonding options available upon request
R&D and Production Supply Small quantity testing and batch supply available
Export Packaging Suitable for international shipment
FAQ
What is a nickel chromium sputtering target?

A nickel chromium sputtering target is a Ni-Cr alloy material used in PVD or magnetron sputtering systems to deposit nickel-chromium films and related functional thin films.

What is NiCr target used for?

NiCr targets are commonly used for Low-E glass coating, electronic films, resistive films, protective coatings, hard coating, decorative coating and functional thin film deposition.

What Ni/Cr ratios can Ti Time provide?

Ti Time can supply Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and customized Ni/Cr ratios according to customer coating requirements.

Can NiCr targets be used for Low-E glass coating?

Yes. Nickel chromium targets are commonly used in large-area glass coating and Low-E glass coating systems. Rotary NiCr targets are often selected for continuous glass coating lines.

Can Ti Time customize NiCr target size?

Yes. Planar, rotary, round, rectangular and custom nickel chromium targets can be produced according to drawings, samples or coating equipment requirements.

Can NiCr targets be bonded with backing plates?

Yes. Nickel chromium targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements.

What information is needed for quotation?

Please provide target composition, purity, size, shape, quantity, drawing if available, surface requirement, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.

Send Inquiry

Ti Time supplies custom nickel chromium sputtering targets for PVD coating, Low-E glass coating, electronic films, resistive films, hard coating and functional thin film applications. Send us your Ni/Cr ratio, target size, drawing, coating equipment model or application requirements, and we will help confirm a suitable NiCr target solution.

Product Highlights

Nickel Chromium Sputtering Target Ti Time supplies custom nickel chromium sputtering targets, also known as NiCr sputtering targets, Ni-Cr targets or nickel chromium alloy targets, for PVD coating, magnetron sputtering, Low-E glass coating, electronic thin films, resistive films, hard coating and ...

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