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Product Details
Product Description
Ti Time supplies custom nickel chromium sputtering targets, also known as NiCr sputtering targets, Ni-Cr targets or nickel chromium alloy targets, for PVD coating, magnetron sputtering, Low-E glass coating, electronic thin films, resistive films, hard coating and functional thin film deposition.
Nickel chromium targets are widely used to deposit NiCr alloy films with good corrosion resistance, thermal stability, electrical resistance and coating uniformity. Common Ni/Cr ratios include Ni80Cr20, Ni60Cr40, Ni56Cr44 and customized compositions according to coating process requirements.
Ti Time can provide planar NiCr targets, rotary NiCr targets, round NiCr targets, rectangular NiCr targets and custom-machined nickel chromium targets according to customer drawings, samples or coating equipment requirements.

Nickel chromium sputtering targets are used in vacuum coating systems to deposit nickel-chromium alloy films. NiCr films are widely used in Low-E glass, large-area architectural glass coating, electronic components, resistive films, heating-related films, protective coatings and selected hard coating applications.
For Low-E glass coating, NiCr layers can help improve visible light transmittance and infrared reflection when used in suitable coating structures. For electronic applications, NiCr films are often used where stable resistance, corrosion resistance and good film uniformity are required.
Ti Time focuses on stable alloy composition, controlled machining accuracy and flexible customization. We can support R&D coating trials, small-batch testing and production-size target supply.
| Item | Specification |
|---|---|
| Product Name | Nickel Chromium Sputtering Target |
| Other Names | NiCr Sputtering Target, Ni-Cr Target, Nickel Chromium Alloy Target |
| Material | Nickel Chromium Alloy |
| Composition | Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 or customized |
| Purity | 99.5%, 99.8%, 99.9%, 99.95% or customized |
| Shape | Planar, rotary, round, rectangular, plate or custom shape |
| Manufacturing Process | Vacuum melting, melting, rolling, machining, thermal spraying or suitable process according to specification |
| Surface Finish | Machined, ground, polished or customized |
| Application | Low-E glass coating, electronic films, resistive films, PVD coating, hard coating, decorative coating, functional thin film |
| Custom Options | Ni/Cr ratio, purity, size, shape, tolerance, surface finish, backing plate bonding and mounting structure |

Different Ni/Cr ratios can be selected according to film resistance, optical performance, corrosion resistance, thermal stability and coating system design.
| Composition | Ni Content | Cr Content | Typical Feature | Common Application |
|---|---|---|---|---|
| Ni80Cr20 | 80 wt% | 20 wt% | Common NiCr ratio with good corrosion resistance and electrical performance | Low-E glass, resistive films, electronic components |
| Ni60Cr40 | 60 wt% | 40 wt% | Higher chromium content for improved oxidation and corrosion resistance | Functional coatings, protective films, selected PVD processes |
| Ni56Cr44 | 56 wt% | 44 wt% | Chromium-rich NiCr composition for special coating requirements | Glass coating, protective coating and project-based films |
| Ni50Cr50 | 50 wt% | 50 wt% | Balanced Ni-Cr composition for custom coating design | R&D coating trials and special thin film applications |
| Custom NiCr Ratio | Customized | Customized | Adjusted according to film design and sputtering process | Custom PVD applications and customer-defined coating systems |
Note: Final Ni/Cr ratio should be confirmed according to coating equipment, film design, electrical resistance requirement, optical performance and customer technical specification.
The following table is a general reference for NiCr sputtering targets. Final impurity limits can be adjusted according to purity grade, production process and customer specification.
| Item | Ni80Cr20 Reference | Ni56Cr44 Reference | Control Purpose |
|---|---|---|---|
| Ni | Balance | Balance | Main alloy element |
| Cr | 20 ± 1 wt% | 44 ± 1 wt% | Main alloy element |
| C | ≤100–200 ppm | ≤100–200 ppm | Carbon impurity control |
| N | ≤100–200 ppm | ≤100–200 ppm | Nitrogen impurity control |
| O | ≤200–300 ppm | ≤200–300 ppm | Oxygen impurity control |
| Fe | Controlled by purity grade | Controlled by purity grade | Metallic impurity control |
| Al | Controlled by purity grade | Controlled by purity grade | Metallic impurity control |
| Si | Controlled by purity grade | Controlled by purity grade | Metallic impurity control |
| Test Method | ICP, GDMS, LECO or suitable method | ICP, GDMS, LECO or suitable method | Available upon request |
Note: The above values are reference ranges. Final chemical composition should be confirmed according to order specification and inspection standard.
Ti Time can produce nickel chromium sputtering targets according to customer drawings or coating equipment requirements.
| Target Type | Description |
|---|---|
| Planar NiCr Target | Flat target for magnetron sputtering and large-area coating systems |
| Rotary NiCr Target | Rotating target for continuous glass coating or higher target utilization |
| Round NiCr Target | Disc-shaped target for laboratory or planar sputtering systems |
| Rectangular NiCr Target | Flat rectangular target for industrial coating equipment |
| Custom NiCr Target | Produced according to drawings, samples or old target photos |

Ti Time can provide NiCr targets according to different coating equipment and project requirements.
| Target Type | Size Capability |
|---|---|
| Planar NiCr Target | Length, width and thickness customized according to equipment |
| Rotary NiCr Target | Tube length, diameter and wall thickness customized |
| Round NiCr Target | Diameter and thickness customized |
| Rectangular NiCr Target | Length, width and thickness customized |
| Custom NiCr Target | Produced according to drawings or old target samples |
For quotation, customers can provide target drawings, old target photos, coating equipment model, required Ni/Cr ratio, purity and quantity.
Nickel chromium sputtering targets are used in many coating and thin film applications.
| Application Area | Typical Use |
|---|---|
| Low-E Glass Coating | Large-area architectural glass and energy-saving glass coating |
| Electronic Films | Electronic components, resistor films and functional metal layers |
| Resistive Films | Thin film resistors, strain gauge films and precision resistance layers |
| Protective Coating | Corrosion-resistant and oxidation-resistant coating layers |
| Hard Coating | Selected tool, mold and mechanical part coating systems |
| Decorative Coating | Hardware, instruments, optical parts and consumer products |
| Heating-related Films | Functional resistance and thermal film applications |
| R&D Coating Trials | Laboratory thin film deposition and process development |

Nickel chromium sputtering targets are widely used in large-area glass coating systems, especially in Low-E glass coating structures. Under suitable coating design, NiCr films can help improve visible light transmittance and infrared reflection performance.
For glass coating lines, rotary NiCr targets are commonly selected for continuous coating operation and improved target utilization.

NiCr films are also used in electronic components, resistive films and functional thin film systems. Ni80Cr20 is a common composition for resistive and electronic film applications because it provides a useful balance of corrosion resistance, electrical performance and sputtering stability.
Typical applications include thin film resistors, sensor films, electronic functional layers and laboratory film development.
Many coating systems require non-standard target sizes, special Ni/Cr ratios or customized mounting structures. Ti Time can produce NiCr sputtering targets according to customer drawings, samples, old target photos or coating equipment information.
| Custom Option | Available Capability |
|---|---|
| Composition | Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and customized Ni/Cr ratios |
| Shape | Planar, rotary, round, rectangular and custom shapes |
| Size | Diameter, length, width, thickness and tube size customized |
| Machining | Chamfers, holes, grooves, steps and mounting structures |
| Surface | Machined, ground, polished or customized |
| Backing Plate | Copper, molybdenum or other backing plates upon request |
| Packing | Protective export packaging for international shipment |

Nickel chromium targets can be supplied as standalone targets or bonded with backing plates according to coating equipment requirements. Backing plate bonding helps improve installation stability and heat transfer during sputtering operation.
| Bonding Option | Description |
|---|---|
| Copper Backing Plate | Common option for heat transfer and equipment compatibility |
| Molybdenum Backing Plate | Used for selected high-temperature or special coating systems |
| Indium Bonding | Suitable for some sputtering target assemblies |
| Elastomer Bonding | Available according to equipment and project requirements |
| Custom Bonding | Produced according to drawings or old target samples |
The suitable bonding method should be confirmed according to target size, sputtering power, cooling design and coating equipment requirements.
Ti Time controls nickel chromium target production from raw material selection to alloy preparation, forming, machining, surface inspection and final packaging. Quality control can be arranged according to customer project requirements.
| Inspection Item | Purpose |
|---|---|
| Chemical Composition | Confirm Ni/Cr ratio and impurity level |
| Relative Density | Support stable sputtering performance |
| Microstructure | Available when required by the project |
| Dimension Check | Confirm size, tolerance and mounting structure |
| Surface Inspection | Check surface finish and visible defects |
| Packing Inspection | Reduce damage during export transportation |

Ti Time supplies titanium, aluminum, chromium, zirconium, molybdenum, tungsten, niobium, tantalum, nickel alloys and related sputtering targets for coating and industrial applications. For nickel chromium sputtering targets, we focus on stable alloy ratio, practical customization and clear technical communication before production.
| Ti Time Advantage | What It Means for Customers |
|---|---|
| Custom Ni/Cr Ratio | Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and custom ratios available |
| Planar and Rotary Targets | Suitable for laboratory, industrial and large-area glass coating systems |
| Drawing-based Machining | Suitable for non-standard coating equipment |
| Backing Plate Support | Bonding options available upon request |
| R&D and Production Supply | Small quantity testing and batch supply available |
| Export Packaging | Suitable for international shipment |
A nickel chromium sputtering target is a Ni-Cr alloy material used in PVD or magnetron sputtering systems to deposit nickel-chromium films and related functional thin films.
NiCr targets are commonly used for Low-E glass coating, electronic films, resistive films, protective coatings, hard coating, decorative coating and functional thin film deposition.
Ti Time can supply Ni80Cr20, Ni60Cr40, Ni56Cr44, Ni50Cr50 and customized Ni/Cr ratios according to customer coating requirements.
Yes. Nickel chromium targets are commonly used in large-area glass coating and Low-E glass coating systems. Rotary NiCr targets are often selected for continuous glass coating lines.
Yes. Planar, rotary, round, rectangular and custom nickel chromium targets can be produced according to drawings, samples or coating equipment requirements.
Yes. Nickel chromium targets can be bonded with copper, molybdenum or other backing plates according to customer equipment requirements.
Please provide target composition, purity, size, shape, quantity, drawing if available, surface requirement, bonding requirement and coating application. Old target photos or coating equipment information are also helpful.
Ti Time supplies custom nickel chromium sputtering targets for PVD coating, Low-E glass coating, electronic films, resistive films, hard coating and functional thin film applications. Send us your Ni/Cr ratio, target size, drawing, coating equipment model or application requirements, and we will help confirm a suitable NiCr target solution.
Product Highlights
Nickel Chromium Sputtering Target Ti Time supplies custom nickel chromium sputtering targets, also known as NiCr sputtering targets, Ni-Cr targets or nickel chromium alloy targets, for PVD coating, magnetron sputtering, Low-E glass coating, electronic thin films, resistive films, hard coating and ...
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